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VALTR, Miroslav, Petr KLAPETEK, Vilma BURŠÍKOVÁ, Ivan OHLÍDAL and Daniel FRANTA. Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge. Chem. listy. Praha: Česká společnost chemická, 2008, vol. 102, No 16, p. 1529-1532. ISSN 0009-2770.
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Basic information
Original name Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
Name in Czech Morfologie povrchu amorfních uhlíkových vrstev s příměsí vodíku deponované v pulzním radiofrekvenčním výboji
Authors VALTR, Miroslav (203 Czech Republic, guarantor), Petr KLAPETEK (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic) and Daniel FRANTA (203 Czech Republic).
Edition Chem. listy, Praha, Česká společnost chemická, 2008, 0009-2770.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 0.593
RIV identification code RIV/00216224:14310/08:00024346
Organization unit Faculty of Science
UT WoS 000208452600051
Keywords in English plasma enhanced chemical vapor deposition;pulsed discharge;atomic force microscopy
Tags atomic force microscopy, pulsed discharge
Tags International impact, Reviewed
Changed by Changed by: Mgr. Miroslav Valtr, Ph.D., učo 13715. Changed: 8/12/2008 13:51.
Abstract
We studied in this work surface morphology of thin amorphous hydrocarbon films by means of atomic force microscope. The AFM data were collected in two regions on the sample. We observed a significant difference in roughness parameters between these regions with increasing total deposition time. RMS values of the heights near the edge of the sample did not exhibit any significant change with the total deposition time and in the mean are equal to approximately 7 nm. However, RMS values of the heights in the center of the sample increased linearly with the total deposition time and reached values up to 125.6 nm. The values of autocorrelation length were independent on total deposition time, but there was a difference in absolute values. The mean value of this parameter near the edge of the sample was 145 nm, while in the center of the sample the respective value was 359 nm. The suggested reason for this surface non-uniformity is the reactor design.
Links
KAN311610701, research and development projectName: Nanometrologie využívající metod rastrovací sondové mikroskopie
Investor: Academy of Sciences of the Czech Republic
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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