Detailed Information on Publication Record
2008
DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 ATMOSPHEREIN N2 + HMDSO + O2 ATMOSPHERE
STUDNIČKA, Filip, David TRUNEC, Pavel SŤAHEL, Vilma BURŠÍKOVÁ, Lukáš KELAR et. al.Basic information
Original name
DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 ATMOSPHEREIN N2 + HMDSO + O2 ATMOSPHERE
Name in Czech
DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 ATMOSPHERE
Authors
STUDNIČKA, Filip (203 Czech Republic), David TRUNEC (203 Czech Republic, guarantor), Pavel SŤAHEL (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic) and Lukáš KELAR (203 Czech Republic)
Edition
Chemické Listy, II Central European Symposium on Plasma Chemistry 2008, 2008, 1803-2389
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
RIV identification code
RIV/00216224:14310/08:00025102
Organization unit
Faculty of Science
UT WoS
000208452600049
Keywords in English
plasma deposition
Tags
Tags
International impact, Reviewed
Změněno: 31/3/2010 07:16, doc. RNDr. Vilma Buršíková, Ph.D.
V originále
The aim of the work was to study the deposition of thin films in ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 atmosphere. The mechanical properties of films were studied by indentation techniques. The films exhibited hardnes in the range from 0.5 to 7 GPa depending on the deposition conditions.
In Czech
Článek se zabývá depozicí tenkých vrstev v atmosférickém homogenním výboji ve směsi N2 + HMDSO + O2. Mechanické vlastnosti tenkých vrstev byly změřeny metodou indentační a tvrdost vrstev byla v rozmezí 0.5 až 7 GPa v závislosti na depozičních podmínkách.
Links
| GA202/06/1473, research and development project |
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