Detailed Information on Publication Record
2008
NUCLEATION AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF ULTRANANOCRYSTALLINE DIAMOND FILMS ON DIFFERENT SUBSTRATES
KARÁSKOVÁ, Monika, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ, Ondřej JAŠEK, Daniel FRANTA et. al.Basic information
Original name
NUCLEATION AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF ULTRANANOCRYSTALLINE DIAMOND FILMS ON DIFFERENT SUBSTRATES
Name in Czech
Nukleace a růst ultrananokrystalických diamantových vrstev metodou PEVCD na různých substrátech
Authors
KARÁSKOVÁ, Monika (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic), Ondřej JAŠEK (203 Czech Republic), Daniel FRANTA (203 Czech Republic), Jiřina MATĚJKOVÁ (203 Czech Republic) and Petr KLAPETEK (203 Czech Republic)
Edition
1. vyd. Brno, CESPC II Book Of Extended Abstracts, p. 159-160, 2 pp. 2008
Publisher
Masarykova Univerzita
Other information
Language
English
Type of outcome
Stať ve sborníku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
RIV identification code
RIV/00216224:14310/08:00024394
Organization unit
Faculty of Science
Keywords in English
ultrananocrystalline diamond; PECVD; nucleation
Tags
International impact
Změněno: 12/1/2009 17:26, Mgr. Ondřej Jašek, Ph.D.
V originále
Ultrananocrystalline diamond (UNCD) films were deposited in microwave bell jar plasma reactor of ASTeX type. The applied mw power, pressure and substrate temperature were from 800 to 950 W, 7.5 kPa and from 1000 to 1100K. The deposition mixture were from 2 to 9.4 percent of methane in methane/hydrogen gas feed. Reactor was modified by rf capacitive discharge providing a negative dc self bias -125V at the substrate holder, for using bias enhanced nucleation (BEN) methode as a pretreatement method. The mechanical properties were studied by depth sensing indentation technique using FISHERSCOPE H100 XYp, the surface morphology of the deposited films was studied by atomic force microscopy (AFM) and scanning electron microscopy (SEM).The UNCD films exhibited high hardness of 70 GPa, elastic modulus of 375 GPa and very low roughness in the range from 9 to 18 nm.
In Czech
Ultrananokrystalické diamantové vrstvy byly připraveny v reaktoru ASTEX ze směsi metan vodík za pomoci nukleace metodou BEN. Mechanické vlastnosti byly zkoumány pomocí nanoidentace na přístroji FISHERSCOPE H100 XYp a morfologie vrstev byla zkoumána metodami AFM a SEM.
Links
| GA202/05/0607, research and development project |
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| KAN311610701, research and development project |
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| MSM0021622411, plan (intention) |
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