KARÁSKOVÁ, Monika, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ, Ondřej JAŠEK, Daniel FRANTA, Jiřina MATĚJKOVÁ and Petr KLAPETEK. NUCLEATION AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF ULTRANANOCRYSTALLINE DIAMOND FILMS ON DIFFERENT SUBSTRATES. In CESPC II Book Of Extended Abstracts. 1st ed. Brno: Masarykova Univerzita, 2008, p. 159-160.
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Basic information
Original name NUCLEATION AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF ULTRANANOCRYSTALLINE DIAMOND FILMS ON DIFFERENT SUBSTRATES
Name in Czech Nukleace a růst ultrananokrystalických diamantových vrstev metodou PEVCD na různých substrátech
Authors KARÁSKOVÁ, Monika (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic), Ondřej JAŠEK (203 Czech Republic), Daniel FRANTA (203 Czech Republic), Jiřina MATĚJKOVÁ (203 Czech Republic) and Petr KLAPETEK (203 Czech Republic).
Edition 1. vyd. Brno, CESPC II Book Of Extended Abstracts, p. 159-160, 2 pp. 2008.
Publisher Masarykova Univerzita
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/08:00024394
Organization unit Faculty of Science
Keywords in English ultrananocrystalline diamond; PECVD; nucleation
Tags nucleation, PECVD, ultrananocrystalline diamond
Tags International impact
Changed by Changed by: Mgr. Ondřej Jašek, Ph.D., učo 8533. Changed: 12/1/2009 17:26.
Abstract
Ultrananocrystalline diamond (UNCD) films were deposited in microwave bell jar plasma reactor of ASTeX type. The applied mw power, pressure and substrate temperature were from 800 to 950 W, 7.5 kPa and from 1000 to 1100K. The deposition mixture were from 2 to 9.4 percent of methane in methane/hydrogen gas feed. Reactor was modified by rf capacitive discharge providing a negative dc self bias -125V at the substrate holder, for using bias enhanced nucleation (BEN) methode as a pretreatement method. The mechanical properties were studied by depth sensing indentation technique using FISHERSCOPE H100 XYp, the surface morphology of the deposited films was studied by atomic force microscopy (AFM) and scanning electron microscopy (SEM).The UNCD films exhibited high hardness of 70 GPa, elastic modulus of 375 GPa and very low roughness in the range from 9 to 18 nm.
Abstract (in Czech)
Ultrananokrystalické diamantové vrstvy byly připraveny v reaktoru ASTEX ze směsi metan vodík za pomoci nukleace metodou BEN. Mechanické vlastnosti byly zkoumány pomocí nanoidentace na přístroji FISHERSCOPE H100 XYp a morfologie vrstev byla zkoumána metodami AFM a SEM.
Links
GA202/05/0607, research and development projectName: Příprava uhlíkových mikro- a nanostruktur plazmovými technologiemi
Investor: Czech Science Foundation, Synthesis of carbon micro- and nanostructures by plasma technologies
KAN311610701, research and development projectName: Nanometrologie využívající metod rastrovací sondové mikroskopie
Investor: Academy of Sciences of the Czech Republic
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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