Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
VALTR, Miroslav, Petr KLAPETEK, Vilma BURŠÍKOVÁ, Ivan OHLÍDAL and Daniel FRANTA. Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge. In 2nd Central European Symposium on Plasma Chemistry. 2008. |
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Original name | Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge |
Name in Czech | Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge |
Authors | VALTR, Miroslav (203 Czech Republic), Petr KLAPETEK (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic, guarantor), Ivan OHLÍDAL (203 Czech Republic) and Daniel FRANTA (203 Czech Republic). |
Edition | 2nd Central European Symposium on Plasma Chemistry, 2008. |
Other information | |
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Original language | English |
Type of outcome | Conference abstract |
Field of Study | 10305 Fluids and plasma physics |
Country of publisher | Czech Republic |
Confidentiality degree | is not subject to a state or trade secret |
RIV identification code | RIV/00216224:14310/08:00025189 |
Organization unit | Faculty of Science |
UT WoS | 000208452600051 |
Keywords in English | Surface; morphology; amorphous hydrocarbon thin films; pulsed radiofrequency discharge |
Tags | amorphous hydrocarbon thin films, morphology, pulsed radiofrequency discharge, Surface |
Tags | International impact |
Changed by | Changed by: Mgr. Adrian Stoica, Ph.D., učo 250983. Changed: 14/1/2009 13:59. |
Abstract |
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Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of the common techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aim of this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films. |
Abstract (in Czech) |
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Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of the common techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aim of this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films. |
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GA202/07/1669, research and development project | Name: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích |
Investor: Czech Science Foundation, Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges |
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