Detailed Information on Publication Record
2008
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
VALTR, Miroslav, Petr KLAPETEK, Vilma BURŠÍKOVÁ, Ivan OHLÍDAL, Daniel FRANTA et. al.Basic information
Original name
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
Name in Czech
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
Authors
VALTR, Miroslav (203 Czech Republic), Petr KLAPETEK (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic, guarantor), Ivan OHLÍDAL (203 Czech Republic) and Daniel FRANTA (203 Czech Republic)
Edition
2nd Central European Symposium on Plasma Chemistry, 2008
Other information
Language
English
Type of outcome
Konferenční abstrakt
Field of Study
10305 Fluids and plasma physics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
RIV identification code
RIV/00216224:14310/08:00025189
Organization unit
Faculty of Science
UT WoS
000208452600051
Keywords in English
Surface; morphology; amorphous hydrocarbon thin films; pulsed radiofrequency discharge
Tags
International impact
Změněno: 14/1/2009 13:59, Mgr. Adrian Stoica, Ph.D.
V originále
Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of the common techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aim of this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.
In Czech
Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of the common techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aim of this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.
Links
| GA202/07/1669, research and development project |
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