Detailed Information on Publication Record
2008
Preparation and characterisation of carbon films prepared from HMDSZ/Methane/Nitrogen or Hydrogen mixture using PECVD
KELAR, Lukáš, Vilma BURŠÍKOVÁ and Zdeněk BOCHNÍČEKBasic information
Original name
Preparation and characterisation of carbon films prepared from HMDSZ/Methane/Nitrogen or Hydrogen mixture using PECVD
Name in Czech
Preparation and characterisation of carbon films prepared from HMDSZ/Methane/Nitrogen or Hydrogen mixture using PECVD
Authors
KELAR, Lukáš, Vilma BURŠÍKOVÁ and Zdeněk BOCHNÍČEK
Edition
2nd Central European Symposium on Plasma Chemistry, 2008
Other information
Language
English
Type of outcome
Konferenční abstrakt
Field of Study
10305 Fluids and plasma physics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
Organization unit
Faculty of Science
UT WoS
000208452600039
Keywords in English
Preparation; characterisation; carbon films; HMDSZ; Methane; Nitrogen; Hydrogen; mixture; PECVD
Tags
Tags
International impact
Změněno: 14/1/2009 14:15, Mgr. Adrian Stoica, Ph.D.
V originále
Carbon films are often used in various applications. In case of HDLC (amorphous hydrogenated carbon) there may be a problem with internal stress in the film, which can cause cracking or delamination of all the film. It is known that silicon incorporation into the film decreases the internal stress in the film. The aim of the present work was to study the effect of the negative self-bias voltage and the HMDSZ (Si2NC6H19) content in the deposition mixture on the properties of thin films prepared from HMDSZ/methane/nitrogen or hydrogen or argon mixtures.
In Czech
Carbon films are often used in various applications. In case of HDLC (amorphous hydrogenated carbon) there may be a problem with internal stress in the film, which can cause cracking or delamination of all the film. It is known that silicon incorporation into the film decreases the internal stress in the film. The aim of the present work was to study the effect of the negative self-bias voltage and the HMDSZ (Si2NC6H19) content in the deposition mixture on the properties of thin films prepared from HMDSZ/methane/nitrogen or hydrogen or argon mixtures.
Links
| GA202/07/1669, research and development project |
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