GROZA, A., A. SURMEIAN, C. DIPLASU, A. TEMPEZ, P. CHAPON, L. LOBO, L. BORDEL, Tereza SCHMIDTOVÁ, Petr VAŠINA, P. BELENGUER, T. NELIS, P. GUILLOT, N. TUCCITO and A. LICCIARDELLO. Ionization Processes and Plasma Chemistry in Pulsed RF Glow Discharge TOF Mass Spectroscopy for Thin Film Depth Profile Analyses. In Book of Abstracts, Second Central European Symposium on Plasma Chemistry. Brno: Masarykova univerzita, 2008, p. 72-73.
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Basic information
Original name Ionization Processes and Plasma Chemistry in Pulsed RF Glow Discharge TOF Mass Spectroscopy for Thin Film Depth Profile Analyses
Name in Czech Ionizační procesy a plazmová chemie v pulzním RF výboji TOF hmotnostního spektrometru užitá pro hloubkové profily tenkých vrstev
Authors GROZA, A. (642 Romania), A. SURMEIAN (642 Romania), C. DIPLASU (642 Romania), A. TEMPEZ (250 France), P. CHAPON (250 France), L. LOBO (724 Spain), L. BORDEL (724 Spain), Tereza SCHMIDTOVÁ (203 Czech Republic), Petr VAŠINA (203 Czech Republic, guarantor), P. BELENGUER (250 France), T. NELIS (250 France), P. GUILLOT (250 France), N. TUCCITO (380 Italy) and A. LICCIARDELLO (380 Italy).
Edition Brno, Book of Abstracts, Second Central European Symposium on Plasma Chemistry, p. 72-73, 2 pp. 2008.
Publisher Masarykova univerzita
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/08:00027406
Organization unit Faculty of Science
Keywords in English depth profiles; TOF spectrometry
Tags depth profiles, TOF spectrometry
Tags International impact, Reviewed
Changed by Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 14/1/2009 17:00.
Abstract
Ionization Processes and Plasma Chemistry in Pulsed RF Glow Discharge TOF Mass Spectroscopy for Thin Film Depth Profile Analyses, proceeding
Abstract (in Czech)
Ionizační procesy a plazmová chemie v pulzním RF výboji TOF hmotnostního spektrometru užitá pro hloubkové profily tenkých vrstev, sborník
Links
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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