Detailed Information on Publication Record
2009
Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process
VAŠINA, Petr and Pavel DVOŘÁKBasic information
Original name
Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process
Name in Czech
Analýza harmonických složek napětí v plazmatu jako nástroj kontrolu vf. naprašování
Authors
VAŠINA, Petr (203 Czech Republic, guarantor) and Pavel DVOŘÁK (203 Czech Republic)
Edition
Europhysics Letters, European Physical Society, 2009, 0295-5075
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
France
Confidentiality degree
není předmětem státního či obchodního tajemství
Impact factor
Impact factor: 2.893
RIV identification code
RIV/00216224:14310/09:00029226
Organization unit
Faculty of Science
UT WoS
000263692500019
Keywords in English
higher harmonics; plasma; discharge; reactive sputtering; magnetron
Tags
International impact, Reviewed
Změněno: 24/6/2009 14:05, prof. Mgr. Petr Vašina, Ph.D.
V originále
The reactive magnetron sputtering deposition process controlled by the flow of the reactive gas exhibits processing stability problems. Since the optimal experimental conditions lie very close to the abrupt transition from the metallic to the compound mode, the range at which the films with the right stoichiometry are deposited at high deposition rates is strongly limited and permanent process monitoring is necessary. A sensitive method for the process monitoring is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages during the radio-frequency sputtering deposition process. The voltage waveform recorded by the uncompensated probe placed in the vicinity of the plasma contains much higher relative proportion of higher harmonics than the waveform measured on the cathode. Some of the harmonics are extremely sensitive markers of the transition between the two regimes of interest. For example, the amplitude of some harmonics measured by the probe change severalfold by the transition compared to the conventionally used bias on the cathode, which changes typically only by a few percents. The proposed method can even reach the sensitivity of optical emission spectroscopy mainly for reactive sputtering of those elements whose sputtering yield does not differ substantially in the metallic and in the compound state.
In Czech
Popis velmi citlivé metody monitorování stavu vysokofrekvenčního reaktivního magnetronového naprašování pomocí sledování amplitud vyšších harmonických frekvencí generovaných výbojem.
Links
| GP202/08/P038, research and development project |
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| MSM0021622411, plan (intention) |
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