VAŠINA, Petr and Pavel DVOŘÁK. Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process. Europhysics Letters, European Physical Society, 2009, vol. 85, No 1, p. 15002-15006. ISSN 0295-5075.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process
Name in Czech Analýza harmonických složek napětí v plazmatu jako nástroj kontrolu vf. naprašování
Authors VAŠINA, Petr (203 Czech Republic, guarantor) and Pavel DVOŘÁK (203 Czech Republic).
Edition Europhysics Letters, European Physical Society, 2009, 0295-5075.
Other information
Original language English
Type of outcome article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher France
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 2.893
RIV identification code RIV/00216224:14310/09:00029226
Organization unit Faculty of Science
UT WoS 000263692500019
Keywords in English higher harmonics; plasma; discharge; reactive sputtering; magnetron
Tags discharge, higher harmonics, magnetron, plasma, reactive sputtering
Tags International impact, Reviewed
Changed by Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 24/6/2009 14:05.
Abstract
The reactive magnetron sputtering deposition process controlled by the flow of the reactive gas exhibits processing stability problems. Since the optimal experimental conditions lie very close to the abrupt transition from the metallic to the compound mode, the range at which the films with the right stoichiometry are deposited at high deposition rates is strongly limited and permanent process monitoring is necessary. A sensitive method for the process monitoring is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages during the radio-frequency sputtering deposition process. The voltage waveform recorded by the uncompensated probe placed in the vicinity of the plasma contains much higher relative proportion of higher harmonics than the waveform measured on the cathode. Some of the harmonics are extremely sensitive markers of the transition between the two regimes of interest. For example, the amplitude of some harmonics measured by the probe change severalfold by the transition compared to the conventionally used bias on the cathode, which changes typically only by a few percents. The proposed method can even reach the sensitivity of optical emission spectroscopy mainly for reactive sputtering of those elements whose sputtering yield does not differ substantially in the metallic and in the compound state.
Abstract (in Czech)
Popis velmi citlivé metody monitorování stavu vysokofrekvenčního reaktivního magnetronového naprašování pomocí sledování amplitud vyšších harmonických frekvencí generovaných výbojem.
Links
GP202/08/P038, research and development projectName: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev
Investor: Czech Science Foundation, Postdoctoral projects
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Research Intents
PrintDisplayed: 6/4/2020 08:39