Detailed Information on Publication Record
2008
Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces
LEHOCKÝ, Marian, Pavel SŤAHEL, Marek KOUTNÝ, Jan ČECH, Jakub INSTITORIS et. al.Basic information
Original name
Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces
Name in Czech
Adheze Rhodococcus SP.S3E2 and Rhodococcus SP.S3E3 k plazmatem připravenému teflonu podobnému povrchu a organosilikonovým povrchům
Authors
LEHOCKÝ, Marian (203 Czech Republic), Pavel SŤAHEL (203 Czech Republic, guarantor, belonging to the institution), Marek KOUTNÝ (203 Czech Republic), Jan ČECH (203 Czech Republic, belonging to the institution), Jakub INSTITORIS (203 Czech Republic) and Aleš MRÁČEK (203 Czech Republic)
Edition
Journal of Materials Processing Technology, Elsevier B.V. 2008, 0924-0136
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Netherlands
Confidentiality degree
není předmětem státního či obchodního tajemství
Impact factor
Impact factor: 1.143
RIV identification code
RIV/00216224:14310/08:00025315
Organization unit
Faculty of Science
UT WoS
000264674500016
Keywords in English
Rhodococcus; Plasma deposition; Cell adhesion; Barrier discharge; Thin films
Tags
International impact, Reviewed
Změněno: 17/1/2014 11:27, Mgr. Jan Čech, Ph.D.
V originále
Investigation of Rhodococcus SP.S3E2 and Rhodococcus SP.S3E3 adhesion to hydrophobic teflon like films and organosilicon films deposited on the paper substrate.
In Czech
Studium adheze Rhodococcus SP.S3E2 and Rhodococcus SP.S3E3 k hydrofobním teflonu podobným vrstvám a organosilikonovým vrstvám deponovaným na papír.
Links
| GA202/05/0777, research and development project |
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| MSM0021622411, plan (intention) |
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