Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen

SCHMIDTOVÁ, Tereza and Petr VAŠINA. Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen. In Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8. Brno: Brno University of Technology, 2009, p. 75-75. ISBN 978-80-214-3875-0.

Basic information

• Original name: Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen
• Name in Czech: Modelování magnetronového naprašování v dusiku a vodíku
• Authors: SCHMIDTOVÁ, Tereza (203 Czech Republic) and Petr VAŠINA (203 Czech Republic, guarantor).
• Edition: Brno, Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, p. 75-75, 1 pp. 2009.
• Publisher: Brno University of Technology

Other information

• Original language: English
• Type of outcome: Proceedings paper
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: Czech Republic
• Confidentiality degree: is not subject to a state or trade secret
• RIV identification code: RIV/00216224:14310/09:00029368
• Organization unit: Faculty of Science
• ISBN: 978-80-214-3875-0
• Keywords (in Czech): modelovaní; magnetron
• Keywords in English: modelling; magnetron
• Tags: magnetron, Modelling
• Tags: International impact, Reviewed

Abstract

Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen, procceding

Abstract (in Czech)

Modelování magnetronového naprašování v dusiku a vodíku, sborník

Links

• GP202/08/P038, research and development project: Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev

Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition

• MSM0021622411, plan (intention): Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface