Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?

VAŠINA, Petr and Pavel DVOŘÁK. Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? In Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts. Brno: VUT Brno, 2009, p. 74. ISBN 978-80-214-3875-0.

Basic information

• Original name: Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?
• Name in Czech: Lze kontrolovat otravu terče při magnetronovém naprašování pomocí vyšších harmonických frekvencí výbojového napětí?
• Authors: VAŠINA, Petr (203 Czech Republic, guarantor) and Pavel DVOŘÁK (203 Czech Republic).
• Edition: Brno, Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts, p. 74-74, 2009.
• Publisher: VUT Brno

Other information

• Original language: English
• Type of outcome: Proceedings paper
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: Czech Republic
• Confidentiality degree: is not subject to a state or trade secret
• RIV identification code: RIV/00216224:14310/09:00029369
• Organization unit: Faculty of Science
• ISBN: 978-80-214-3875-0
• Keywords (in Czech): vyšší harmoniky; plazma; magnetron; naprašování
• Keywords in English: higher harmonics; plasma; discharge; reactive sputtering; magnetron
• Tags: discharge, higher harmonics, magnetron, plasma, reactive sputtering
• Tags: International impact

Abstract

Reactive sputtering controlled by flow of the reactive gas suffers from problems in processing stability caused by an abrupt transition between the metallic and the compound mode. During this transition many important parameters including target composition and gas composition change dramatically. A sensitive monitoring method is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages. Voltage waveforms recorded from the cathode and from an uncompensated probe were analyzed. Uncompensated probe exhibited higher sensitivity significantly better than sensitivity of any other known electrical method used for the control of magnetron sputtering process. Moreover, some particular experiments show that the changes in amplitudes of the harmonics by the transition are due to the changes of the target composition rather than due the change of the gas composition.

Abstract (in Czech)

Kontrola otrávení terče při magnetronovém naprašování pomocí vyšších harmonických frekvencí napětí.

Links

• GP202/08/P038, research and development project: Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev

Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition

• MSM0021622411, plan (intention): Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface