D 2009

Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?

VAŠINA, Petr and Pavel DVOŘÁK

Basic information

Original name

Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?

Name in Czech

Lze kontrolovat otravu terče při magnetronovém naprašování pomocí vyšších harmonických frekvencí výbojového napětí?

Authors

VAŠINA, Petr (203 Czech Republic, guarantor) and Pavel DVOŘÁK (203 Czech Republic)

Edition

Brno, Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts, p. 74-74, 2009

Publisher

VUT Brno

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/09:00029369

Organization unit

Faculty of Science

ISBN

978-80-214-3875-0

Keywords (in Czech)

vyšší harmoniky; plazma; magnetron; naprašování

Keywords in English

higher harmonics; plasma; discharge; reactive sputtering; magnetron

Tags

International impact
Změněno: 24/6/2009 13:46, doc. Mgr. Pavel Dvořák, Ph.D.

Abstract

V originále

Reactive sputtering controlled by flow of the reactive gas suffers from problems in processing stability caused by an abrupt transition between the metallic and the compound mode. During this transition many important parameters including target composition and gas composition change dramatically. A sensitive monitoring method is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages. Voltage waveforms recorded from the cathode and from an uncompensated probe were analyzed. Uncompensated probe exhibited higher sensitivity significantly better than sensitivity of any other known electrical method used for the control of magnetron sputtering process. Moreover, some particular experiments show that the changes in amplitudes of the harmonics by the transition are due to the changes of the target composition rather than due the change of the gas composition.

In Czech

Kontrola otrávení terče při magnetronovém naprašování pomocí vyšších harmonických frekvencí napětí.

Links

GP202/08/P038, research and development project
Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev
Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition
MSM0021622411, plan (intention)
Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface