| VAŠINA, Petr, Tereza SCHMIDTOVÁ a Marek ELIÁŠ. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions. Plasma Sources Science and Technology. Bristol: Institute of Physics Publishing, 2009, roč. 18, č. 2, 8 s. ISSN 0963-0252. |
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@article{838268,
author = {Vašina, Petr and Schmidtová, Tereza and Eliáš, Marek},
article_location = {Bristol},
article_number = {2},
keywords = {magnetron sputtering; reactive; Berg},
language = {eng},
issn = {0963-0252},
journal = {Plasma Sources Science and Technology},
title = {Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions},
volume = {18},
year = {2009}
}
TY - JOUR
ID - 838268
AU - Vašina, Petr - Schmidtová, Tereza - Eliáš, Marek
PY - 2009
TI - Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions
JF - Plasma Sources Science and Technology
VL - 18
IS - 2
PB - Institute of Physics Publishing
SN - 09630252
KW - magnetron sputtering
KW - reactive
KW - Berg
N2 - The paper model reactive magnetron sputtering deposition process by modified Bergs model. We test also role of different temperature conditions on hysteresys behaviour and role of non-uniform discharge current density.
ER -
VAŠINA, Petr, Tereza SCHMIDTOVÁ a Marek ELIÁŠ. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions. \textit{Plasma Sources Science and Technology}. Bristol: Institute of Physics Publishing, 2009, roč.~18, č.~2, 8 s. ISSN~0963-0252.
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