Detailed Information on Publication Record
2009
Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions
VAŠINA, Petr, Tereza SCHMIDTOVÁ and Marek ELIÁŠBasic information
Original name
Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions
Name in Czech
Modelování magnetronového naprašování s nerovnoměrnou proudovou hustotou a různými teplotními podmínkami
Authors
VAŠINA, Petr (203 Czech Republic, guarantor), Tereza SCHMIDTOVÁ (203 Czech Republic) and Marek ELIÁŠ (203 Czech Republic)
Edition
Plasma Sources Science and Technology, Bristol, Institute of Physics Publishing, 2009, 0963-0252
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
United Kingdom of Great Britain and Northern Ireland
Confidentiality degree
není předmětem státního či obchodního tajemství
Impact factor
Impact factor: 2.384
RIV identification code
RIV/00216224:14310/09:00029371
Organization unit
Faculty of Science
UT WoS
000265580800014
Keywords (in Czech)
modelovaní; magnetron
Keywords in English
magnetron sputtering; reactive; Berg
Tags
Změněno: 27/3/2010 10:14, prof. Mgr. Petr Vašina, Ph.D.
V originále
The paper model reactive magnetron sputtering deposition process by modified Bergs model. We test also role of different temperature conditions on hysteresys behaviour and role of non-uniform discharge current density.
In Czech
Modelování magnetronového naprašování s nerovnoměrnou proudovou hustotou a různými teplotními podmínkami, článek
Links
| GP202/08/P038, research and development project |
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| MSM0021622411, plan (intention) |
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