D 2008

Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane

ZAJÍČKOVÁ, Lenka, Zuzana KUČEROVÁ, Vilma BURŠÍKOVÁ, Daniel FRANTA, Vratislav PEŘINA et. al.

Basic information

Original name

Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane

Name in Czech

Složení a funkční vlastnosti organosilikonových polymerů vytvářených z hexamethyldisiloxanu a octamethylcyclotetrasiloxanu

Authors

ZAJÍČKOVÁ, Lenka, Zuzana KUČEROVÁ, Vilma BURŠÍKOVÁ, Daniel FRANTA, Vratislav PEŘINA and Anna MACKOVÁ

Edition

WARRENDALE, ORGANIC/INORGANIC HYBRID MATERIALS - 2007, p. 159-164, 6 pp. 2008

Publisher

MATERIALS RESEARCH SOCIETY

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

Organization unit

Faculty of Science

ISBN

978-1-55899-967-1

ISSN

UT WoS

000256796400019

Keywords in English

THIN-FILMS; HYBRID; DEPOSITION; SILICA; MODEL

Tags

International impact, Reviewed
Změněno: 27/3/2013 09:19, doc. Mgr. Lenka Zajíčková, Ph.D.

Abstract

V originále

Hybrid organic-inorganic thin films with different fractions of silicon oxide were deposited in rf capacitively coupled discharges using pure hexamethyldisiloxane (HMDSO), octamethylcyclotetrasiloxane (D4) or 5 % HMDSO in O-2. The deposition in continuous wave (cw) mode was compared with pulsed conditions under which the discharge on-time was 5 ms and the off-time varied from 0.5 to 15 ms. The chemical composition of the films was studied by FTIR, RBS and ERDA. Their optical properties in UV/visible/NIR were determined from spectroscopic ellipsometry and reflectance measurements fitted with a Kramers-Kronig consistent dispersion model based on a parametrization of density of states. Film hardness and reduced modulus were determined from depth sensing indentation tests.

In Czech

Hybrid organic-inorganic thin films with different fractions of silicon oxide were deposited in rf capacitively coupled discharges using pure hexamethyldisiloxane (HMDSO), octamethylcyclotetrasiloxane (D4) or 5 % HMDSO in O-2. The deposition in continuous wave (cw) mode was compared with pulsed conditions under which the discharge on-time was 5 ms and the off-time varied from 0.5 to 15 ms. The chemical composition of the films was studied by FTIR, RBS and ERDA. Their optical properties in UV/visible/NIR were determined from spectroscopic ellipsometry and reflectance measurements fitted with a Kramers-Kronig consistent dispersion model based on a parametrization of density of states. Film hardness and reduced modulus were determined from depth sensing indentation tests.

Links

MSM0021622411, plan (intention)
Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
1K05025, research and development project
Name: Příprava nových Si-O(N)-C materiálů plazmochemickou metodou
Investor: Ministry of Education, Youth and Sports of the CR, Synthesis of new Si-O(N)-C materials by plasmachemical methods