Reactive magnetron sputtering - modelling of different target utilization in metallic and compound ...
| VAŠINA, Petr and Tereza SCHMIDTOVÁ. Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously. In E-MRS 2009 SYMPOSIUM P Protective coatings and Thin films’09. 2009. |
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| Basic information | |
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| Original name | Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously |
| Name in Czech | Reaktivní magnetronové naprašování - modelování různého využítí terče a situace když je kyslík a vodík připouštěn současně |
| Authors | VAŠINA, Petr (203 Czech Republic, guarantor, belonging to the institution) and Tereza SCHMIDTOVÁ (203 Czech Republic, belonging to the institution). |
| Edition | E-MRS 2009 SYMPOSIUM P Protective coatings and Thin films’09, 2009. |
| Other information | |
|---|---|
| Original language | English |
| Type of outcome | Conference abstract |
| Field of Study | 10305 Fluids and plasma physics |
| Country of publisher | France |
| Confidentiality degree | is not subject to a state or trade secret |
| RIV identification code | RIV/00216224:14310/09:00049591 |
| Organization unit | Faculty of Science |
| Keywords (in Czech) | reaktivní naprašování |
| Keywords in English | reactive sputtering |
| Tags | IK, rivok |
| Tags | International impact, Reviewed |
| Changed by | Changed by: Mgr. Tereza Schmidtová, Ph.D., učo 151253. Changed: 5/4/2012 14:19. |
| Abstract |
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| Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously, proceeding |
| Abstract (in Czech) |
|---|
| Reaktivní magnetronové naprašování - modelování různého využítí terče a situace když je kyslík a vodík připouštěn současně, sborník |
| Links | |
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| GP202/08/P038, research and development project | Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev |
| Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition | |
| MSM0021622411, plan (intention) | Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
| Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface | |
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