Reactive magnetron sputtering - modelling of different target utilization in metallic and compound ...
VAŠINA, Petr and Tereza SCHMIDTOVÁ. Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously. In E-MRS 2009 SYMPOSIUM P Protective coatings and Thin films’09. 2009. |
Other formats:
BibTeX
LaTeX
RIS
|
Basic information | |
---|---|
Original name | Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously |
Name in Czech | Reaktivní magnetronové naprašování - modelování různého využítí terče a situace když je kyslík a vodík připouštěn současně |
Authors | VAŠINA, Petr (203 Czech Republic, guarantor, belonging to the institution) and Tereza SCHMIDTOVÁ (203 Czech Republic, belonging to the institution). |
Edition | E-MRS 2009 SYMPOSIUM P Protective coatings and Thin films’09, 2009. |
Other information | |
---|---|
Original language | English |
Type of outcome | Conference abstract |
Field of Study | 10305 Fluids and plasma physics |
Country of publisher | France |
Confidentiality degree | is not subject to a state or trade secret |
RIV identification code | RIV/00216224:14310/09:00049591 |
Organization unit | Faculty of Science |
Keywords (in Czech) | reaktivní naprašování |
Keywords in English | reactive sputtering |
Tags | IK, rivok |
Tags | International impact, Reviewed |
Changed by | Changed by: Mgr. Tereza Schmidtová, Ph.D., učo 151253. Changed: 5/4/2012 14:19. |
Abstract |
---|
Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously, proceeding |
Abstract (in Czech) |
---|
Reaktivní magnetronové naprašování - modelování různého využítí terče a situace když je kyslík a vodík připouštěn současně, sborník |
Links | |
---|---|
GP202/08/P038, research and development project | Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev |
Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition | |
MSM0021622411, plan (intention) | Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface |
PrintDisplayed: 26/7/2024 15:25