a 2009

Measurement of plasma potential waveform in capacitive discharge

DVOŘÁK, Pavel

Basic information

Original name

Measurement of plasma potential waveform in capacitive discharge

Name in Czech

Měření průběhu potenciálu plazmatu kapacitního výboje

Authors

DVOŘÁK, Pavel (203 Czech Republic, guarantor, belonging to the institution)

Edition

ICPIG 2009 - Conference proceedings, 2009

Other information

Language

English

Type of outcome

Konferenční abstrakt

Field of Study

10305 Fluids and plasma physics

Country of publisher

Mexico

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/09:00049592

Organization unit

Faculty of Science

Keywords (in Czech)

potenciál plazmatu; vyšší harmonické frekvence; kapacitně vázaný výboj; plazma

Keywords in English

plasma potential; higher harmonic frequencies; capacitively coupled discharge; plasma

Tags

Tags

International impact, Reviewed
Změněno: 5/4/2012 13:13, doc. Mgr. Pavel Dvořák, Ph.D.

Abstract

V originále

The uncompensated probe was used for measurement of plasma potential waveforms. A method is presented that enables calculation of probe sheath voltage and, consequently, enables to get the plasma potential waveform by means of probe measurements. The method was successfully tested in nitrogen plasma. In order to get reliable results the method requires knowledge of plasma parameters which can be measured by a compensated Langmuir probe. It was shown that the waveforms of plasma potential and probe voltage differ significantly. Therefore, the influence of the probe sheath voltage whose calculation is presented can not be neglected by measurement of the plasma potential. At low pressure, the plasma potential waveform contained high amount of higher harmonic frequencies that were ignited namely during the fast expansion of the sheath at the powered electrode.

In Czech

Popis, test a první výsledky metody umožňující měřit průběh potenciálu plazmatu pomocí nekompenzované sondy.

Links

GA202/07/1669, research and development project
Name: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích
Investor: Czech Science Foundation, Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges
MSM0021622411, plan (intention)
Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface