DVOŘÁK, Pavel. Measurement of plasma potential waveform in capacitive discharge. In ICPIG 2009 - Conference proceedings. 2009.
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Basic information
Original name Measurement of plasma potential waveform in capacitive discharge
Name in Czech Měření průběhu potenciálu plazmatu kapacitního výboje
Authors DVOŘÁK, Pavel (203 Czech Republic, guarantor, belonging to the institution).
Edition ICPIG 2009 - Conference proceedings, 2009.
Other information
Original language English
Type of outcome Conference abstract
Field of Study 10305 Fluids and plasma physics
Country of publisher Mexico
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/09:00049592
Organization unit Faculty of Science
Keywords (in Czech) potenciál plazmatu; vyšší harmonické frekvence; kapacitně vázaný výboj; plazma
Keywords in English plasma potential; higher harmonic frequencies; capacitively coupled discharge; plasma
Tags IK, rivok
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Pavel Dvořák, Ph.D., učo 16711. Changed: 5/4/2012 13:13.
Abstract
The uncompensated probe was used for measurement of plasma potential waveforms. A method is presented that enables calculation of probe sheath voltage and, consequently, enables to get the plasma potential waveform by means of probe measurements. The method was successfully tested in nitrogen plasma. In order to get reliable results the method requires knowledge of plasma parameters which can be measured by a compensated Langmuir probe. It was shown that the waveforms of plasma potential and probe voltage differ significantly. Therefore, the influence of the probe sheath voltage whose calculation is presented can not be neglected by measurement of the plasma potential. At low pressure, the plasma potential waveform contained high amount of higher harmonic frequencies that were ignited namely during the fast expansion of the sheath at the powered electrode.
Abstract (in Czech)
Popis, test a první výsledky metody umožňující měřit průběh potenciálu plazmatu pomocí nekompenzované sondy.
Links
GA202/07/1669, research and development projectName: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích
Investor: Czech Science Foundation, Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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