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@article{861755, author = {Losurdo, Maria and Bergmair, Michael and Bruno, Giovanni and Catellan, D. and Cobet, C. and de Martino, A. and Fleischer, K. and DohcevicandMitrovic, Z. and Esser, N. and Gaillet, M. and Gajic, R. and Hemzal, Dušan and Hingerl, K. and Humlíček, Josef and Ossikovski, R. and Popovic, Z.V. and Saxl, O. and Hemzal, Dušan and Humlíček, Josef}, article_location = {Dordrecht}, article_number = {7}, keywords = {Spectroscopic ellipsometry; Polarimetry; Nanomaterials; Nanoparticles; Thin films; Optical characterization; Nanometrology.}, language = {eng}, issn = {1388-0764}, journal = {Journal of Nanoparticle Research}, title = {Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives}, volume = {11}, year = {2009} }
TY - JOUR ID - 861755 AU - Losurdo, Maria - Bergmair, Michael - Bruno, Giovanni - Catellan, D. - Cobet, C. - de Martino, A. - Fleischer, K. - Dohcevic-Mitrovic, Z. - Esser, N. - Gaillet, M. - Gajic, R. - Hemzal, Dušan - Hingerl, K. - Humlíček, Josef - Ossikovski, R. - Popovic, Z.V. - Saxl, O. - Hemzal, Dušan - Humlíček, Josef PY - 2009 TI - Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives JF - Journal of Nanoparticle Research VL - 11 IS - 7 SP - 1521-1554 EP - 1521-1554 PB - Springer Netherlands SN - 13880764 KW - Spectroscopic ellipsometry KW - Polarimetry KW - Nanomaterials KW - Nanoparticles KW - Thin films KW - Optical characterization KW - Nanometrology. N2 - This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measurement and analysis of nanometric films, metal nanoparticles and nanowires, semiconductor nanocrystals, and submicron periodic structures. We show that ellipsometry is capable of more than the determination of thickness and optical properties, and it can be exploited to gain information about process control, This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. ER -
LOSURDO, Maria, Michael BERGMAIR, Giovanni BRUNO, D. CATELLAN, C. COBET, A. DE MARTINO, K. FLEISCHER, Z. DOHCEVIC-MITROVIC, N. ESSER, M. GAILLET, R. GAJIC, Dušan HEMZAL, K. HINGERL, Josef HUMLÍČEK, R. OSSIKOVSKI, Z.V. POPOVIC a O. SAXL. Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives. Online. \textit{Journal of Nanoparticle Research}. Dordrecht: Springer Netherlands, 2009, roč.~11, č.~7, s.~1521-1554. ISSN~1388-0764. [citováno 2024-04-24]
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