Impact of neutral gas temperatures on reactive magnetron sputtering
| SCHMIDTOVÁ, Tereza and Petr VAŠINA. Impact of neutral gas temperatures on reactive magnetron sputtering. In Potential and Applications of Thin Ceramic and Metal Coatings. Plzeň: University of West Bohemia, 2010, p. 75-76. ISBN 978-80-7043-894-7. |
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| Basic information | |
|---|---|
| Original name | Impact of neutral gas temperatures on reactive magnetron sputtering |
| Name in Czech | Vilv teploty neutrálního plynu na reaktivní magnetronové naprašování |
| Authors | SCHMIDTOVÁ, Tereza (203 Czech Republic) and Petr VAŠINA (203 Czech Republic, guarantor). |
| Edition | Plzeň, Potential and Applications of Thin Ceramic and Metal Coatings, p. 75-76, 2 pp. 2010. |
| Publisher | University of West Bohemia |
| Other information | |
|---|---|
| Original language | English |
| Type of outcome | Proceedings paper |
| Field of Study | 10305 Fluids and plasma physics |
| Country of publisher | Czech Republic |
| Confidentiality degree | is not subject to a state or trade secret |
| RIV identification code | RIV/00216224:14310/10:00044481 |
| Organization unit | Faculty of Science |
| ISBN | 978-80-7043-894-7 |
| Keywords (in Czech) | magnetronové naprašování, modelování, teplota, hystereze |
| Keywords in English | magnetron sputtering; modelling; temperature; hysteresis |
| Changed by | Changed by: Mgr. Tereza Schmidtová, Ph.D., učo 151253. Changed: 2/9/2010 09:02. |
| Abstract |
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| Temperature is an important parameter which influences whole sputtering process. A model of reactive magnetron sputtering was used to investigate an effect of different temperatures in reactor during reactive sputtering on a hysteresis behaviour of the sputtering. We report shifts of transitions between two modes of a reactive sputtering process. |
| Abstract (in Czech) |
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| Teplota je důležitým parametrem, který ovlivňuje celý rozprašovací proces. Pro vyšetření vlivu různých teplot v reaktoru na hysterezní chování při procesu rozprašování byl použit model reaktivního magnetronového naprašování. Prezentuje posun ve skocích mezi dvěma módy reaktivního rozprašováního procesu. |
| Links | |
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| GD104/09/H080, research and development project | Name: Plazmochemické procesy a jejich technologické aplikace |
| Investor: Czech Science Foundation | |
| GP202/08/P038, research and development project | Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev |
| Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition | |
| MSM0021622411, plan (intention) | Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
| Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface | |
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