J 2010

Optical and mechanical characterization of ultrananocrystalline diamond films prepared in dual frequency discharges

KARÁSKOVÁ, Monika, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ, Daniel FRANTA, David NEČAS et. al.

Basic information

Original name

Optical and mechanical characterization of ultrananocrystalline diamond films prepared in dual frequency discharges

Authors

KARÁSKOVÁ, Monika (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic, belonging to the institution), Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution), Daniel FRANTA (203 Czech Republic, belonging to the institution), David NEČAS (203 Czech Republic, belonging to the institution), Olga BLÁHOVÁ (203 Czech Republic) and Jiří ŠPERKA (203 Czech Republic, belonging to the institution)

Edition

Surface & coatings technology, Elsevier Science, 2010, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Netherlands

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 2.141

RIV identification code

RIV/00216224:14310/10:00040570

Organization unit

Faculty of Science

UT WoS

000275692100026

Keywords in English

ultrananocrystalline diamond; bias enhanced nucleation; indentation hardness; ellipsometry; FTIR
Změněno: 27/3/2013 09:11, doc. Mgr. Lenka Zajíčková, Ph.D.

Abstract

V originále

Ultrananocrystalline diamond (UNCD) films were deposited directly on polished c-Si substrates in microwave discharge (2.45 GHz) combined with rf capacitive plasma (13.56 MHz) ignited at the substrate electrode. The rf discharge induced a dc self-bias accelerating ions towards the growing film during the whole deposition process. The substrate was either preheated in hydrogen discharge to the deposition temperature of 900 C or the deposition of intermediate layer started at about 200 C and reached 900 C in the 5th minute. The latter procedure resulted in the deposition of coating with the hardness of 70 GPa and very good fracture toughness. The analysis of optical measurement in UV-IR range confirmed the presence of 250 nm thick intermediate layer containing DLC and SiC materials.

Links

GA202/07/1669, research and development project
Name: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích
Investor: Czech Science Foundation, Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges
KAN311610701, research and development project
Name: Nanometrologie využívající metod rastrovací sondové mikroskopie
Investor: Academy of Sciences of the Czech Republic
MSM0021622411, plan (intention)
Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface