Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere
| SCHMIDTOVÁ, Tereza and Petr VAŠINA. Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere. In Potential and Applications of Nanotretment of Medical Surface. Liberec: Technical University of Liberec, 2010, p. 59-60. ISBN 978-80-7372-631-7. |
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| Basic information | |
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| Original name | Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere |
| Name in Czech | Chování hybridního PVD-PECVD procesu Ti rozprašování v argonové a acetylenová atmosféře |
| Authors | SCHMIDTOVÁ, Tereza (203 Czech Republic) and Petr VAŠINA (203 Czech Republic, guarantor). |
| Edition | Liberec, Potential and Applications of Nanotretment of Medical Surface, p. 59-60, 2010. |
| Publisher | Technical University of Liberec |
| Other information | |
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| Original language | English |
| Type of outcome | Proceedings paper |
| Field of Study | 10305 Fluids and plasma physics |
| Country of publisher | Czech Republic |
| Confidentiality degree | is not subject to a state or trade secret |
| RIV identification code | RIV/00216224:14310/10:00044659 |
| Organization unit | Faculty of Science |
| ISBN | 978-80-7372-631-7 |
| Keywords (in Czech) | magnetronové naprašování, modelování, hybdrivní proces, hystereze |
| Keywords in English | magnetron sputtering; modelling; hybrid process; hysteresis |
| Changed by | Changed by: Mgr. Tereza Schmidtová, Ph.D., učo 151253. Changed: 2/9/2010 09:30. |
| Abstract |
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| Hybrid PVD-PECVD sputtering process was studied for the case of titanium target sputtering in argon and acetylene atmosphere. The hybrid PVD-PECVD process combines aspects of conventional sputtering of metal target with hydrocarbon vapour as a source of carbon. We present and discuss significant differences between behaviour of conventional reactive magnetron sputtering and such hybrid process. |
| Abstract (in Czech) |
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| Hybridní naprašovací process PVD-PECVD byl studován pro případ rozprašování titanového terče v atmosféře argon, acetylen. Hybridní PVD-PECVD proces kombinuje aspekty obvyklého rozprašování kovového terče s plynným uhlovodíkem, který je zdrojem uhlíku. Zde prezentujeme a diskutujeme výrazné rozdíly mezi chováním obvyklého reaktivního magnetronového naprašování s takovýmto hybridním procesem. |
| Links | |
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| GD104/09/H080, research and development project | Name: Plazmochemické procesy a jejich technologické aplikace |
| Investor: Czech Science Foundation | |
| GP202/08/P038, research and development project | Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev |
| Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition | |
| MSM0021622411, plan (intention) | Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
| Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface | |
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