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DVOŘÁK, Pavel, Petr VAŠINA, Vilma BURŠÍKOVÁ and Radek ŽEMLIČKA. Higher harmonic frequencies in capacitive discharges. In 63rd GEC and 7th ICRP - Conference Proceedings. Paříž: Japan Society of Applied Physics, 2010, p. CTP-142, 2 pp. ISBN 978-4-86348-101-5.
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Basic information
Original name Higher harmonic frequencies in capacitive discharges
Name in Czech Vyšší harmonické frekvence v kapacitních výbojích
Authors DVOŘÁK, Pavel (203 Czech Republic, guarantor), Petr VAŠINA (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic) and Radek ŽEMLIČKA (203 Czech Republic).
Edition Paříž, 63rd GEC and 7th ICRP - Conference Proceedings, p. CTP-142, 2 pp. 2010.
Publisher Japan Society of Applied Physics
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher France
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/10:00045011
Organization unit Faculty of Science
ISBN 978-4-86348-101-5
Keywords (in Czech) vyšší harmonické frekvence; koncentrace elektronů; plazma
Keywords in English higher harmonic frequencies; electron concentration; plasma
Changed by Changed by: doc. Mgr. Pavel Dvořák, Ph.D., učo 16711. Changed: 11/10/2010 13:19.
Abstract
Dependence of amplitudes of higher harmonic frequencies on electron concentration.
Abstract (in Czech)
Závislost amplitud vyšších harmonických frekvencí na koncentraci elektronů.
Links
GA202/07/1669, research and development projectName: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích
Investor: Czech Science Foundation, Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges
GP202/08/P038, research and development projectName: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev
Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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