Detailed Information on Publication Record
2010
Investigation of silicon surface wettability after plasma treatment
SKÁCELOVÁ, Dana, Pavel SŤAHEL, Martin HANIČINEC and Mirko ČERNÁKBasic information
Original name
Investigation of silicon surface wettability after plasma treatment
Authors
SKÁCELOVÁ, Dana, Pavel SŤAHEL, Martin HANIČINEC and Mirko ČERNÁK
Edition
Bratislava, HAKONE XII Contributed paper, 307 pp. 2010
Publisher
Comenius University
Other information
Language
English
Type of outcome
Stať ve sborníku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Slovakia
Confidentiality degree
není předmětem státního či obchodního tajemství
Organization unit
Faculty of Science
ISBN
978-80-89186-71-6
Keywords in English
Diffuse coplanar DBD, silicon, plasma treatment
Změněno: 5/4/2012 16:39, Mgr. Dana Skácelová, Ph.D.
Abstract
V originále
In this contribution the influence of the plasma on crystalline Si (100) surface was studied. Dielectric barrier discharge the so called Diffuse Coplanar Surface Barrier Discharge (DCSBD) to plasma modification was used. The silicon surface modification after plasma treatment was investigated by AFM and contact angle measurement. Different way to clean the surface is reflected on the surface wettability after plasma treatment and the ageing effect of treated surface was studied too.
Links
KAN101630651, research and development project |
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MSM0021622411, plan (intention) |
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