Suppressed hysteresis behaviour of Ti sputtering in acetylene gas

SCHMIDTOVÁ, Tereza, Petr VAŠINA and Marek ELIÁŠ. Suppressed hysteresis behaviour of Ti sputtering in acetylene gas. 2010.

Basic information

• Original name: Suppressed hysteresis behaviour of Ti sputtering in acetylene gas
• Name in Czech: Potlačené hysterezní chování naprašování titanu v acetylenu
• Authors: SCHMIDTOVÁ, Tereza (203 Czech Republic, belonging to the institution), Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution) and Marek ELIÁŠ (203 Czech Republic, belonging to the institution).
• Edition: 2010.

Other information

• Original language: English
• Type of outcome: Conference abstract
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: Germany
• Confidentiality degree: is not subject to a state or trade secret
• RIV identification code: RIV/00216224:14310/10:00045788
• Organization unit: Faculty of Science
• Keywords (in Czech): magnetronové naprašování; hystereze; hybridní PVD-PECVd proces; kontrola řízení
• Keywords in English: magnetron sputtering; hysteresis; hybrid PVD-PECVD; process control

Abstract

Suppressed hysteresis behaviour of Ti sputtering in acetylene gas. Modelling of hybrid PVD-PECVD process.

Links

• GD104/09/H080, research and development project: Name: Plazmochemické procesy a jejich technologické aplikace

Investor: Czech Science Foundation

• GP202/08/P038, research and development project: Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev

Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition

• MSM0021622411, plan (intention): Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface