Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering.
| SCHMIDTOVÁ, Tereza and Petr VAŠINA. Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering. In GEC/ICRP 2010. 2010. ISSN 0003-0503. |
|
Other formats:
BibTeX
LaTeX
RIS
|
| Basic information | |
|---|---|
| Original name | Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering. |
| Name in Czech | Chování hybridního PVD-PECVD procesu ve srovnání s tradičním reaktivním magnetronovým naprašováním. |
| Authors | SCHMIDTOVÁ, Tereza (203 Czech Republic, belonging to the institution) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution). |
| Edition | GEC/ICRP 2010, 2010. |
| Other information | |
|---|---|
| Original language | English |
| Type of outcome | Conference abstract |
| Field of Study | 10305 Fluids and plasma physics |
| Country of publisher | France |
| Confidentiality degree | is not subject to a state or trade secret |
| RIV identification code | RIV/00216224:14310/10:00045789 |
| Organization unit | Faculty of Science |
| ISSN | 0003-0503 |
| Keywords (in Czech) | magnetronové naprašování; hystereze; hybridní PVD-PECVD proces |
| Keywords in English | magnetron sputtering; hysteresis; hybrid PVD-PECVD process |
| Changed by | Changed by: Mgr. Tereza Schmidtová, Ph.D., učo 151253. Changed: 4/1/2011 09:48. |
| Abstract |
|---|
| Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering. Modelling of hybrid PVD-PECVd process. |
| Links | |
|---|---|
| GD104/09/H080, research and development project | Name: Plazmochemické procesy a jejich technologické aplikace |
| Investor: Czech Science Foundation | |
| GP202/08/P038, research and development project | Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev |
| Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition | |
| MSM0021622411, plan (intention) | Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
| Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface | |
PrintDisplayed: 25/8/2024 13:18