Detailed Information on Publication Record
2010
Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering.
SCHMIDTOVÁ, Tereza and Petr VAŠINABasic information
Original name
Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering.
Name in Czech
Chování hybridního PVD-PECVD procesu ve srovnání s tradičním reaktivním magnetronovým naprašováním.
Authors
SCHMIDTOVÁ, Tereza (203 Czech Republic, belonging to the institution) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution)
Edition
GEC/ICRP 2010, 2010
Other information
Language
English
Type of outcome
Konferenční abstrakt
Field of Study
10305 Fluids and plasma physics
Country of publisher
France
Confidentiality degree
není předmětem státního či obchodního tajemství
RIV identification code
RIV/00216224:14310/10:00045789
Organization unit
Faculty of Science
ISSN
Keywords (in Czech)
magnetronové naprašování; hystereze; hybridní PVD-PECVD proces
Keywords in English
magnetron sputtering; hysteresis; hybrid PVD-PECVD process
Změněno: 4/1/2011 09:48, Mgr. Tereza Schmidtová, Ph.D.
Abstract
V originále
Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering. Modelling of hybrid PVD-PECVd process.
Links
GD104/09/H080, research and development project |
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GP202/08/P038, research and development project |
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MSM0021622411, plan (intention) |
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