| DVOŘÁK, Pavel, Petr VAŠINA, Vilma BURŠÍKOVÁ and Radek ŽEMLIČKA. Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage. Plasma Physics and Controlled Fusion. Bristol,UK: Institute of Physics Publishing, 2010, vol. 52, No 12, p. 1-12. ISSN 0741-3335. Available from: https://dx.doi.org/10.1088/0741-3335/52/12/124011. |
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@article{915962,
author = {Dvořák, Pavel and Vašina, Petr and Buršíková, Vilma and Žemlička, Radek},
article_location = {Bristol,UK},
article_number = {12},
doi = {http://dx.doi.org/10.1088/0741-3335/52/12/124011},
keywords = {plasma; higher harmonic frequencies; capacitively coupled discharge; reactive magnetron sputtering; DLC},
language = {eng},
issn = {0741-3335},
journal = {Plasma Physics and Controlled Fusion},
title = {Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage},
url = {https://iopscience.iop.org/article/10.1088/0741-3335/52/12/124011},
volume = {52},
year = {2010}
}
TY - JOUR
ID - 915962
AU - Dvořák, Pavel - Vašina, Petr - Buršíková, Vilma - Žemlička, Radek
PY - 2010
TI - Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage
JF - Plasma Physics and Controlled Fusion
VL - 52
IS - 12
SP - 1-12
EP - 1-12
PB - Institute of Physics Publishing
SN - 07413335
KW - plasma
KW - higher harmonic frequencies
KW - capacitively coupled discharge
KW - reactive magnetron sputtering
KW - DLC
UR - https://iopscience.iop.org/article/10.1088/0741-3335/52/12/124011
L2 - https://iopscience.iop.org/article/10.1088/0741-3335/52/12/124011
N2 - Fourier components of discharge voltages were measured in two different reactive plasmas and their response to the creation or destruction of a thin film was studied. In reactive magnetron sputtering the effect of transition from the metallic to the compound mode accompanied by creation of a compound film on the sputtered target was observed. Further, deposition and etching of a DLC film and their effects on amplitudes of Fourier components of the discharge voltage were studied. It was shown that the Fourier components, including higher harmonic frequencies, sensitively react to the presence of a film. Therefore, they can be used as a powerful tool for the monitoring of deposition and etching processes. It was demonstrated that the behaviour of the Fourier components was caused in both experiments by the presence of the film. The behaviour of the Fourier components can be explained by the difference between coefficients of secondary electron emission of the film and its underlying material.
ER -
DVOŘÁK, Pavel, Petr VAŠINA, Vilma BURŠÍKOVÁ and Radek ŽEMLIČKA. Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage. \textit{Plasma Physics and Controlled Fusion}. Bristol,UK: Institute of Physics Publishing, 2010, vol.~52, No~12, p.~1-12. ISSN~0741-3335. Available from: https://dx.doi.org/10.1088/0741-3335/52/12/124011.
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