J 2010

Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage

DVOŘÁK, Pavel, Petr VAŠINA, Vilma BURŠÍKOVÁ and Radek ŽEMLIČKA

Basic information

Original name

Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage

Name in Czech

Monitoruvání PVD, PECVD a leptacích plazmových procesů pomocí Fourierových komponent vf. napětí

Authors

DVOŘÁK, Pavel (203 Czech Republic, guarantor, belonging to the institution), Petr VAŠINA (203 Czech Republic, belonging to the institution), Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution) and Radek ŽEMLIČKA (203 Czech Republic, belonging to the institution)

Edition

Plasma Physics and Controlled Fusion, Bristol,UK, Institute of Physics Publishing, 2010, 0741-3335

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 2.466

RIV identification code

RIV/00216224:14310/10:00046208

Organization unit

Faculty of Science

DOI

UT WoS

000286181100012

Keywords (in Czech)

plazma; vyšší harmonické frekvence; depozice; reaktivní magnetronové naprašování; diamantu podobné vrstvy

Keywords in English

plasma; higher harmonic frequencies; capacitively coupled discharge; reactive magnetron sputtering; DLC

Tags

International impact
Změněno: 29/6/2020 13:23, Mgr. Marie Šípková, DiS.

Abstract

ORIG CZ

V originále

Fourier components of discharge voltages were measured in two different reactive plasmas and their response to the creation or destruction of a thin film was studied. In reactive magnetron sputtering the effect of transition from the metallic to the compound mode accompanied by creation of a compound film on the sputtered target was observed. Further, deposition and etching of a DLC film and their effects on amplitudes of Fourier components of the discharge voltage were studied. It was shown that the Fourier components, including higher harmonic frequencies, sensitively react to the presence of a film. Therefore, they can be used as a powerful tool for the monitoring of deposition and etching processes. It was demonstrated that the behaviour of the Fourier components was caused in both experiments by the presence of the film. The behaviour of the Fourier components can be explained by the difference between coefficients of secondary electron emission of the film and its underlying material.

In Czech

Fourierovy složky výbojového napětí a napětí nekompenzované sondy byly použity k monitorování dvou různých depozičních procesů. Byly testovány fyzikální důvody reakce Fourierových složek na přítomnost vrstvy.

Links

GA202/07/1669, research and development project
Name: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích
Investor: Czech Science Foundation, Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges
GP202/08/P038, research and development project
Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev
Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition
MSM0021622411, plan (intention)
Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface