Detailed Information on Publication Record
2010
X-ray scattering study of oxide precipitates in Cz-Si
CAHA, Ondřej, Mojmír MEDUŇA, Silvie BERNATOVÁ, Jiří RŮŽIČKA, Petr MIKULÍK et. al.Basic information
Original name
X-ray scattering study of oxide precipitates in Cz-Si
Name in Czech
Studie rtg rozptylu na kyslíkových precipitátech v CZ Si
Authors
CAHA, Ondřej (203 Czech Republic, guarantor, belonging to the institution), Mojmír MEDUŇA (203 Czech Republic, belonging to the institution), Silvie BERNATOVÁ (203 Czech Republic, belonging to the institution), Jiří RŮŽIČKA (203 Czech Republic, belonging to the institution), Petr MIKULÍK (203 Czech Republic, belonging to the institution), Jiří BURŠÍK (203 Czech Republic), Milan SVOBODA (203 Czech Republic) and S. BERNSTORFF (40 Austria)
Edition
2010
Other information
Language
English
Type of outcome
Konferenční abstrakt
Field of Study
10302 Condensed matter physics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
RIV identification code
RIV/00216224:14310/10:00046556
Organization unit
Faculty of Science
ISBN
978-80-254-7361-0
Keywords in English
x-ray; silicon; defects
Změněno: 23/1/2012 15:58, doc. Mgr. Ondřej Caha, Ph.D.
V originále
Two x-ray diffraction methods were used for characterization of the oxide precipitates in Czochralski silicon series of samples. The maping of the diffuse scattering around reciprocal lattice point in Bragg geometry and the simultaneous measurement of the diffracted and transmitted beam intensity in the Laue diffraction geometry.
In Czech
Dvě difrakční metody byly použity pro charakterizaci kyslíkových precipitátů v sérii vzorků CZ křemíku.
Links
GA202/09/1013, research and development project |
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GP202/09/P410, research and development project |
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MSM0021622410, plan (intention) |
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