OHLÍDAL, Ivan, Miloslav OHLÍDAL, David NEČAS, Daniel FRANTA and Vilma BURŠÍKOVÁ. Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry. Thin Solid Films. Elsevier, 2011, vol. 519, No 9, p. 2874-2876. ISSN 0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2010.12.069. |
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@article{940438, author = {Ohlídal, Ivan and Ohlídal, Miloslav and Nečas, David and Franta, Daniel and Buršíková, Vilma}, article_number = {9}, doi = {http://dx.doi.org/10.1016/j.tsf.2010.12.069}, keywords = {Optical characterisation; Non-uniform films; Spectroscopic ellipsometry; Spectroscopic reflectometry; Spectroscopic imaging reflectometry}, language = {eng}, issn = {0040-6090}, journal = {Thin Solid Films}, title = {Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry}, url = {http://dx.doi.org/10.1016/j.tsf.2010.12.069}, volume = {519}, year = {2011} }
TY - JOUR ID - 940438 AU - Ohlídal, Ivan - Ohlídal, Miloslav - Nečas, David - Franta, Daniel - Buršíková, Vilma PY - 2011 TI - Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry JF - Thin Solid Films VL - 519 IS - 9 SP - 2874-2876 EP - 2874-2876 PB - Elsevier SN - 00406090 KW - Optical characterisation KW - Non-uniform films KW - Spectroscopic ellipsometry KW - Spectroscopic reflectometry KW - Spectroscopic imaging reflectometry UR - http://dx.doi.org/10.1016/j.tsf.2010.12.069 L2 - http://dx.doi.org/10.1016/j.tsf.2010.12.069 N2 - The combined opticalmethod enabling us to performthe complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods with using the dispersion model based on parametrisation of density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiOxCyHzthin films. ER -
OHLÍDAL, Ivan, Miloslav OHLÍDAL, David NEČAS, Daniel FRANTA and Vilma BURŠÍKOVÁ. Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry. \textit{Thin Solid Films}. Elsevier, 2011, vol.~519, No~9, p.~2874-2876. ISSN~0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2010.12.069.
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