| OHLÍDAL, Ivan, Miloslav OHLÍDAL, David NEČAS, Daniel FRANTA and Vilma BURŠÍKOVÁ. Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry. Thin Solid Films. Elsevier, 2011, vol. 519, No 9, p. 2874-2876. ISSN 0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2010.12.069. |
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@article{940438,
author = {Ohlídal, Ivan and Ohlídal, Miloslav and Nečas, David and Franta, Daniel and Buršíková, Vilma},
article_number = {9},
doi = {http://dx.doi.org/10.1016/j.tsf.2010.12.069},
keywords = {Optical characterisation; Non-uniform films; Spectroscopic ellipsometry; Spectroscopic reflectometry; Spectroscopic imaging reflectometry},
language = {eng},
issn = {0040-6090},
journal = {Thin Solid Films},
title = {Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry},
url = {http://dx.doi.org/10.1016/j.tsf.2010.12.069},
volume = {519},
year = {2011}
}
TY - JOUR
ID - 940438
AU - Ohlídal, Ivan - Ohlídal, Miloslav - Nečas, David - Franta, Daniel - Buršíková, Vilma
PY - 2011
TI - Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry
JF - Thin Solid Films
VL - 519
IS - 9
SP - 2874-2876
EP - 2874-2876
PB - Elsevier
SN - 00406090
KW - Optical characterisation
KW - Non-uniform films
KW - Spectroscopic ellipsometry
KW - Spectroscopic reflectometry
KW - Spectroscopic imaging reflectometry
UR - http://dx.doi.org/10.1016/j.tsf.2010.12.069
L2 - http://dx.doi.org/10.1016/j.tsf.2010.12.069
N2 - The combined opticalmethod enabling us to performthe complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods with using the dispersion model based on parametrisation of density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiOxCyHzthin films.
ER -
OHLÍDAL, Ivan, Miloslav OHLÍDAL, David NEČAS, Daniel FRANTA and Vilma BURŠÍKOVÁ. Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry. \textit{Thin Solid Films}. Elsevier, 2011, vol.~519, No~9, p.~2874-2876. ISSN~0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2010.12.069.
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