ZAJÍČKOVÁ, Lenka, Daniel FRANTA, David NEČAS, Vilma BURŠÍKOVÁ, Mihai George MURESAN, Vratislav PEŘINA and Christoph COBET. Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture. Thin Solid Films. Elsevier, 2011, vol. 519, No 13, p. 4299-4308. ISSN 0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2011.02.021.
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Basic information
Original name Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture
Authors ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor, belonging to the institution), Daniel FRANTA (203 Czech Republic, belonging to the institution), David NEČAS (203 Czech Republic, belonging to the institution), Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution), Mihai George MURESAN (642 Romania, belonging to the institution), Vratislav PEŘINA (203 Czech Republic, belonging to the institution) and Christoph COBET (276 Germany).
Edition Thin Solid Films, Elsevier, 2011, 0040-6090.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher Netherlands
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 1.890
RIV identification code RIV/00216224:14310/11:00049805
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1016/j.tsf.2011.02.021
UT WoS 000290187100030
Keywords in English Diamond-like carbon; Amorphous hydrogenated carbon; Optical properties; Band structure
Tags AKR, rivok
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 27/3/2013 09:08.
Abstract
The optical properties and structure of a-C:H films were modified by addition of nitrogen into the CH4/H2 deposition mixture. Three films prepared in capacitively coupled rf discharge were compared: (a) hydrogenated diamond like carbon film with hydrogen content of 34 % and indentation hardness of 21.7 GPa, (b) hard a-C:H:N film with nitrogen content of 13 % and indentation hardness of 18.5 GPa and (c) soft a-C:H:N film with nitrogen content of 10 % and indentation hardness of 6.7 GPa. It is shown how the parametrized density of states model describing dielectric response of electronic interband transitions can be applied to modified a-C:H:N and how it can be combined with correct treatment of transmittance measured in infrared range using additional Gaussian peaks in joint density of phonon states. This analysis resulted in determination of film dielectric function in wide spectral range (0.045-30 eV) and provided also information about the density of states of valence and conduction bands and lattice vibrations.
Links
FT-TA5/114, research and development projectName: Vývoj technologie vytváření PECVD vrstev pro výrobu automobilové světelné techniky
Investor: Ministry of Industry and Trade of the CR, Development of technology of PECVD films formation for automotive lighting equipment
GA202/07/1669, research and development projectName: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích
Investor: Czech Science Foundation, Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges
GD104/09/H080, research and development projectName: Plazmochemické procesy a jejich technologické aplikace
Investor: Czech Science Foundation
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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