| SCHMIDTOVÁ, Tereza, Pavel SOUČEK, Petr VAŠINA and Jan SCHÄFER. Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene. Surface & Coatings Technology. Elsevier Science, 2011, vol. 205, July, p. S299-S302, 4 pp. ISSN 0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2011.02.047. |
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@article{944539,
author = {Schmidtová, Tereza and Souček, Pavel and Vašina, Petr and Schäfer, Jan},
article_number = {July},
doi = {http://dx.doi.org/10.1016/j.surfcoat.2011.02.047},
keywords = {Hybrid PVD–PECVD process; Reactive magnetron sputtering; Hysteresis; Modelling},
language = {eng},
issn = {0257-8972},
journal = {Surface & Coatings Technology},
title = {Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene},
url = {https://www.sciencedirect.com/science/article/pii/S0257897211001472?via%3Dihub},
volume = {205},
year = {2011}
}
TY - JOUR
ID - 944539
AU - Schmidtová, Tereza - Souček, Pavel - Vašina, Petr - Schäfer, Jan
PY - 2011
TI - Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene
JF - Surface & Coatings Technology
VL - 205
IS - July
SP - S299-S302
EP - S299-S302
PB - Elsevier Science
SN - 02578972
KW - Hybrid PVD–PECVD process
KW - Reactive magnetron sputtering
KW - Hysteresis
KW - Modelling
UR - https://www.sciencedirect.com/science/article/pii/S0257897211001472?via%3Dihub
N2 - Hybrid PVD–PECVD process of target sputtering in hydrocarbon containing atmosphere combines aspects of both conventional reactive magnetron sputtering (PVD) and plasma enhanced chemical vapour deposition (PECVD). Such process is being typically used for deposition of metal carbides embedded in hydrogenated carbon matrix. Compared to the conventional co-sputtering of metal and carbon targets, in the hybrid deposition process the source of the carbon is dissociated hydrocarbon vapour in plasma. The aim of this paper is to study the extent of similarities or differences between this hybrid process and the conventional reactive magnetron sputtering. We have chosen the sputtering of titanium target in acetylene containing atmosphere as a representative of the hybrid processes. We focused on experimental measurements of the hybrid PVD–PECVD process behaviour, the time necessary for the process to achieve steady-state conditions and basic modelling of the process.
ER -
SCHMIDTOVÁ, Tereza, Pavel SOUČEK, Petr VAŠINA and Jan SCHÄFER. Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene. \textit{Surface \&{} Coatings Technology}. Elsevier Science, 2011, vol.~205, July, p.~S299-S302, 4 pp. ISSN~0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2011.02.047.
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