J 2011

Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene

SCHMIDTOVÁ, Tereza, Pavel SOUČEK, Petr VAŠINA and Jan SCHÄFER

Basic information

Original name

Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene

Authors

SCHMIDTOVÁ, Tereza (203 Czech Republic, belonging to the institution), Pavel SOUČEK (203 Czech Republic, belonging to the institution), Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution) and Jan SCHÄFER (203 Czech Republic)

Edition

Surface & Coatings Technology, Elsevier Science, 2011, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Germany

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 1.867

RIV identification code

RIV/00216224:14310/11:00049862

Organization unit

Faculty of Science

DOI

UT WoS

000293258600064

Keywords in English

Hybrid PVD–PECVD process; Reactive magnetron sputtering; Hysteresis; Modelling

Tags

Změněno: 22/7/2024 10:16, Mgr. Marie Šípková, DiS.

Abstract

V originále

Hybrid PVD–PECVD process of target sputtering in hydrocarbon containing atmosphere combines aspects of both conventional reactive magnetron sputtering (PVD) and plasma enhanced chemical vapour deposition (PECVD). Such process is being typically used for deposition of metal carbides embedded in hydrogenated carbon matrix. Compared to the conventional co-sputtering of metal and carbon targets, in the hybrid deposition process the source of the carbon is dissociated hydrocarbon vapour in plasma. The aim of this paper is to study the extent of similarities or differences between this hybrid process and the conventional reactive magnetron sputtering. We have chosen the sputtering of titanium target in acetylene containing atmosphere as a representative of the hybrid processes. We focused on experimental measurements of the hybrid PVD–PECVD process behaviour, the time necessary for the process to achieve steady-state conditions and basic modelling of the process.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GD104/09/H080, research and development project
Name: Plazmochemické procesy a jejich technologické aplikace
Investor: Czech Science Foundation
GP202/08/P038, research and development project
Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev
Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition
MSM0021622411, plan (intention)
Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface