SCHÄFER, Jan, Stefan HORN, Rüdiger FOEST, Ronny BRANDENBURG, Petr VAŠINA and Klaus-Dieter WELTMANN. Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge. Surface & Coatings Technology. Elsevier Science, vol. 205, 25.7.2011, p. "S330"-"S334", 5 pp. ISSN 0257-8972. doi:10.1016/j.surfcoat.2011.03.124. 2011.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge
Name in Czech Komplexní analýza SiOxCyHz vrstev deponovaných APDBD
Authors SCHÄFER, Jan (203 Czech Republic), Stefan HORN (276 Germany), Rüdiger FOEST (276 Germany), Ronny BRANDENBURG (276 Germany), Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution) and Klaus-Dieter WELTMANN (276 Germany).
Edition Surface & Coatings Technology, Elsevier Science, 2011, 0257-8972.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher Switzerland
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 1.867
RIV identification code RIV/00216224:14310/11:00052854
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1016/j.surfcoat.2011.03.124
UT WoS 000293258600071
Keywords in English SILVER NANOPARTICLES; PLASMA; JET
Tags AKR, rivok
Changed by Changed by: Ing. Andrea Mikešková, učo 137293. Changed: 20/4/2012 10:38.
Abstract
SiOx films are deposited with an atmospheric pressure dielectric barrier discharge (apDBD) using Ar, O2 and different precursor gases (HMDSO and Silane).An experimental study on the influence of the discharge operation parameters on the chemical composition of the deposited films and the vertical structure over the film thickness is carried out by means of SEM, EDX, and ATR–FTIR.
Abstract (in Czech)
SiOx vrstvy byly připraveny s využitím atmosférického DBD výboje z HMDSO a silanu. Byla provedena studie vlivu parametrů výboje na složení, mikrostrukturu a tloušťku vrstvy.
Links
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
PrintDisplayed: 17/4/2024 00:37