a 2011

Experimental study of hybrid PVD-PECVD process of metallic target sputtering in argon and acetylene

SCHMIDTOVÁ, Tereza, Pavel SOUČEK and Petr VAŠINA

Basic information

Original name

Experimental study of hybrid PVD-PECVD process of metallic target sputtering in argon and acetylene

Authors

SCHMIDTOVÁ, Tereza (203 Czech Republic, belonging to the institution), Pavel SOUČEK (203 Czech Republic, belonging to the institution) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution)

Edition

30th ICPIG Conference Proceedings, 2011

Other information

Language

English

Type of outcome

Konferenční abstrakt

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

RIV identification code

RIV/00216224:14310/11:00049988

Organization unit

Faculty of Science

Keywords (in Czech)

hybridní PVD-PECVD proces, magnetronové naprašování, hystereze, OES

Keywords in English

hybrid PVD-PECVD process; magnetron sputtering; hysteresis; OES
Změněno: 6/1/2012 10:45, doc. Mgr. Pavel Souček, Ph.D.

Abstract

V originále

Hybrid PVD-PECVD process of titanium sputtering in argon and acetylene atmosphere combines aspects of both conventional techniques: sputtering of titanium target (PVD) and acetylene as a source of carbon fragments polymerization (PECVD). It has been used for deposition of nanocomposite material consisting of nanocrystallites of titanium carbide embedded in hydrogenated carbon matrix with good mechanical properties. The aim of this contribution is to describe and understand basic processes influencing the deposition process of such films by comparing the behaviour of basic discharge parameters on acetylene supply flow. Hybrid sputtering driven by DC power alone and together with RF substrate bias is studied.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GD104/09/H080, research and development project
Name: Plazmochemické procesy a jejich technologické aplikace
Investor: Czech Science Foundation
GP202/08/P038, research and development project
Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev
Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition
MSM0021622411, plan (intention)
Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface