Experimental study of hybrid PVD-PECVD process of metallic target sputtering in argon and acetylene

SCHMIDTOVÁ, Tereza, Pavel SOUČEK and Petr VAŠINA. Experimental study of hybrid PVD-PECVD process of metallic target sputtering in argon and acetylene. In 30th ICPIG Conference Proceedings. 2011.

Basic information

• Original name: Experimental study of hybrid PVD-PECVD process of metallic target sputtering in argon and acetylene
• Authors: SCHMIDTOVÁ, Tereza (203 Czech Republic, belonging to the institution), Pavel SOUČEK (203 Czech Republic, belonging to the institution) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution).
• Edition: 30th ICPIG Conference Proceedings, 2011.

Other information

• Original language: English
• Type of outcome: Conference abstract
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: United Kingdom of Great Britain and Northern Ireland
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• RIV identification code: RIV/00216224:14310/11:00049988
• Organization unit: Faculty of Science
• Keywords (in Czech): hybridní PVD-PECVD proces, magnetronové naprašování, hystereze, OES
• Keywords in English: hybrid PVD-PECVD process; magnetron sputtering; hysteresis; OES

Abstract

Hybrid PVD-PECVD process of titanium sputtering in argon and acetylene atmosphere combines aspects of both conventional techniques: sputtering of titanium target (PVD) and acetylene as a source of carbon fragments polymerization (PECVD). It has been used for deposition of nanocomposite material consisting of nanocrystallites of titanium carbide embedded in hydrogenated carbon matrix with good mechanical properties. The aim of this contribution is to describe and understand basic processes influencing the deposition process of such films by comparing the behaviour of basic discharge parameters on acetylene supply flow. Hybrid sputtering driven by DC power alone and together with RF substrate bias is studied.

Links

• ED2.1.00/03.0086, research and development project: Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
• GD104/09/H080, research and development project: Name: Plazmochemické procesy a jejich technologické aplikace

Investor: Czech Science Foundation

• GP202/08/P038, research and development project: Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev

Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition

• MSM0021622411, plan (intention): Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface