BURŠÍKOVÁ, Vilma, Olga BLÁHOVÁ, Monika KARÁSKOVÁ, Lenka ZAJÍČKOVÁ, Ondřej JAŠEK, Daniel FRANTA, Petr KLAPETEK and Jiří BURŠÍK. Mechanical Properties of Ultrananocrystalline Thin Films Deposited Using Dual Frequency Discharges. CHEMICKÉ LISTY. Praha: Česká společnost chemická, 2011, vol. 105, CHLSAC 105, p. 98 - 101. ISSN 0009-2770. |
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@article{966868, author = {Buršíková, Vilma and Bláhová, Olga and Karásková, Monika and Zajíčková, Lenka and Jašek, Ondřej and Franta, Daniel and Klapetek, Petr and Buršík, Jiří}, article_location = {Praha}, article_number = {CHLSAC 105}, keywords = {ultrananocrystalline diamond; plasma enhanced chemical vapor deposition; dual frequency discharge; local mechanical properties}, language = {eng}, issn = {0009-2770}, journal = {CHEMICKÉ LISTY}, title = {Mechanical Properties of Ultrananocrystalline Thin Films Deposited Using Dual Frequency Discharges}, url = {http://www.chemicke-listy.cz/docs/full/2011_14_s98-s101.pdf}, volume = {105}, year = {2011} }
TY - JOUR ID - 966868 AU - Buršíková, Vilma - Bláhová, Olga - Karásková, Monika - Zajíčková, Lenka - Jašek, Ondřej - Franta, Daniel - Klapetek, Petr - Buršík, Jiří PY - 2011 TI - Mechanical Properties of Ultrananocrystalline Thin Films Deposited Using Dual Frequency Discharges JF - CHEMICKÉ LISTY VL - 105 IS - CHLSAC 105 SP - 98 - 101 EP - 98 - 101 PB - Česká společnost chemická SN - 00092770 KW - ultrananocrystalline diamond KW - plasma enhanced chemical vapor deposition KW - dual frequency discharge KW - local mechanical properties UR - http://www.chemicke-listy.cz/docs/full/2011_14_s98-s101.pdf L2 - http://www.chemicke-listy.cz/docs/full/2011_14_s98-s101.pdf N2 - The present paper describes the deposition of nanostruc- tured diamond films with low surface roughness, high hard- ness and fracture toughness by microwave PECVD in the ASTeX type reactor from mixture of methane and hydrogen. Films were deposited on a mirror polished (111) oriented n- doped silicon substrate. The film exhibited relatively low roughness, the root mean square (RMS) of heights ranged from 20 to 9.1 nm, depending on the deposition conditions. The hardness was found to be in the range from 22 to 65 GPa and the elastic modulus ranged from 220 to 375 GPa, depend- ing on the film structure ER -
BURŠÍKOVÁ, Vilma, Olga BLÁHOVÁ, Monika KARÁSKOVÁ, Lenka ZAJÍČKOVÁ, Ondřej JAŠEK, Daniel FRANTA, Petr KLAPETEK and Jiří BURŠÍK. Mechanical Properties of Ultrananocrystalline Thin Films Deposited Using Dual Frequency Discharges. \textit{CHEMICKÉ LISTY}. Praha: Česká společnost chemická, 2011, vol.~105, CHLSAC 105, p.~98 - 101. ISSN~0009-2770.
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