Detailed Information on Publication Record
2011
Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films
NEČAS, David, Ivan OHLÍDAL and Daniel FRANTABasic information
Original name
Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films
Name in Czech
Víceúhlová spektroskopická elipsometrie značně ne-uniformních tenkých vrstev
Authors
NEČAS, David (203 Czech Republic, guarantor, belonging to the institution), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution) and Daniel FRANTA (203 Czech Republic, belonging to the institution)
Edition
Journal of Optics, Bristol, IOP Publishing, 2011, 2040-8978
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10306 Optics
Country of publisher
United Kingdom of Great Britain and Northern Ireland
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 1.573
RIV identification code
RIV/00216224:14310/11:00050732
Organization unit
Faculty of Science
UT WoS
000294294500018
Keywords (in Czech)
elipsometrie; tenké vrstvy; neuniformita
Keywords in English
ellipsometry; thin films; non-uniformity
Tags
International impact, Reviewed
Změněno: 20/4/2012 12:03, Ing. Andrea Mikešková
Abstract
V originále
A theoretical approach for including considerable thickness non-uniformity of thin films into the formulae employed within variable-angle spectroscopic ellipsometry is presented. It is based on a combination of the efficient formulae derived for the thickness distribution density corresponding to a wedge-shaped non-uniformity with dependences of the mean thickness and root mean square (rms) of thickness differences on the angle of incidence that take into account the real non-uniformity of the shape. These dependences are derived using momentum expansion of the thickness distribution density. The derived formulae are tested by means of numerical analysis. An application of this approach is illustrated using the optical characterization of a selected sample of non-uniform SiOxCyHz thin films using phase-modulated ellipsometry.
Links
ED1.1.00/02.0068, research and development project |
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FT-TA5/114, research and development project |
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MSM0021622411, plan (intention) |
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