NEČAS, David, Ivan OHLÍDAL and Daniel FRANTA. Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films. Journal of Optics. Bristol: IOP Publishing, 2011, vol. 13, No 8, p. "nestránkováno", 10 pp. ISSN 2040-8978. Available from: https://dx.doi.org/10.1088/2040-8978/13/8/085705.
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Basic information
Original name Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films
Name in Czech Víceúhlová spektroskopická elipsometrie značně ne-uniformních tenkých vrstev
Authors NEČAS, David (203 Czech Republic, guarantor, belonging to the institution), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution) and Daniel FRANTA (203 Czech Republic, belonging to the institution).
Edition Journal of Optics, Bristol, IOP Publishing, 2011, 2040-8978.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10306 Optics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 1.573
RIV identification code RIV/00216224:14310/11:00050732
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1088/2040-8978/13/8/085705
UT WoS 000294294500018
Keywords (in Czech) elipsometrie; tenké vrstvy; neuniformita
Keywords in English ellipsometry; thin films; non-uniformity
Tags AKR, rivok
Tags International impact, Reviewed
Changed by Changed by: Ing. Andrea Mikešková, učo 137293. Changed: 20/4/2012 12:03.
Abstract
A theoretical approach for including considerable thickness non-uniformity of thin films into the formulae employed within variable-angle spectroscopic ellipsometry is presented. It is based on a combination of the efficient formulae derived for the thickness distribution density corresponding to a wedge-shaped non-uniformity with dependences of the mean thickness and root mean square (rms) of thickness differences on the angle of incidence that take into account the real non-uniformity of the shape. These dependences are derived using momentum expansion of the thickness distribution density. The derived formulae are tested by means of numerical analysis. An application of this approach is illustrated using the optical characterization of a selected sample of non-uniform SiOxCyHz thin films using phase-modulated ellipsometry.
Links
ED1.1.00/02.0068, research and development projectName: CEITEC - central european institute of technology
FT-TA5/114, research and development projectName: Vývoj technologie vytváření PECVD vrstev pro výrobu automobilové světelné techniky
Investor: Ministry of Industry and Trade of the CR, Development of technology of PECVD films formation for automotive lighting equipment
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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