FRANTA, Daniel, Ivan OHLÍDAL, David NEČAS, František VIŽĎA, Ondřej CAHA, Martin HASOŇ and Pavel POKORNÝ. Optical characterization of HfO2 thin films. Thin Solid Films. Oxford, UK: Elsevier, 2011, vol. 519, No 18, p. 6085–6091. ISSN 0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2011.03.128. |
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@article{966962, author = {Franta, Daniel and Ohlídal, Ivan and Nečas, David and Vižďa, František and Caha, Ondřej and Hasoň, Martin and Pokorný, Pavel}, article_location = {Oxford, UK}, article_number = {18}, doi = {http://dx.doi.org/10.1016/j.tsf.2011.03.128}, keywords = {Optical properties; Ellipsometry; Spectrophotometry; Hafnium oxide; Transition-metal oxide; Urbach tail}, language = {eng}, issn = {0040-6090}, journal = {Thin Solid Films}, title = {Optical characterization of HfO2 thin films}, url = {http://www.sciencedirect.com/science/article/pii/S0040609011007863}, volume = {519}, year = {2011} }
TY - JOUR ID - 966962 AU - Franta, Daniel - Ohlídal, Ivan - Nečas, David - Vižďa, František - Caha, Ondřej - Hasoň, Martin - Pokorný, Pavel PY - 2011 TI - Optical characterization of HfO2 thin films JF - Thin Solid Films VL - 519 IS - 18 SP - 6085–6091 EP - 6085–6091 PB - Elsevier SN - 00406090 KW - Optical properties KW - Ellipsometry KW - Spectrophotometry KW - Hafnium oxide KW - Transition-metal oxide KW - Urbach tail UR - http://www.sciencedirect.com/science/article/pii/S0040609011007863 L2 - http://www.sciencedirect.com/science/article/pii/S0040609011007863 N2 - Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail. ER -
FRANTA, Daniel, Ivan OHLÍDAL, David NEČAS, František VIŽĎA, Ondřej CAHA, Martin HASOŇ and Pavel POKORNÝ. Optical characterization of HfO2 thin films. \textit{Thin Solid Films}. Oxford, UK: Elsevier, 2011, vol.~519, No~18, p.~6085–6091. ISSN~0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2011.03.128.
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