| KLAPETEK, Petr, Miroslav VALTR, David NEČAS, Ota SALYK a Petr DZIK. Atomic force microscopy analysis of nanoparticles in non-ideal conditions. Nanoscale Research Letter. New York: Springer, 2011, roč. 6, č. 1, s. "nestránkováno", 9 s. ISSN 1931-7573. Dostupné z: https://dx.doi.org/10.1186/1556-276X-6-514. |
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@article{966981,
author = {Klapetek, Petr and Valtr, Miroslav and Nečas, David and Salyk, Ota and Dzik, Petr},
article_location = {New York},
article_number = {1},
doi = {http://dx.doi.org/10.1186/1556-276X-6-514},
keywords = {DYNAMIC LIGHT-SCATTERING; POLYURETHANE NANOPARTICLES; ELECTRON-MICROSCOPY; SURFACES; RECONSTRUCTION; NANOSPHERES; FILMS; SIZE; TIPS; PD},
language = {eng},
issn = {1931-7573},
journal = {Nanoscale Research Letter},
title = {Atomic force microscopy analysis of nanoparticles in non-ideal conditions},
volume = {6},
year = {2011}
}
TY - JOUR
ID - 966981
AU - Klapetek, Petr - Valtr, Miroslav - Nečas, David - Salyk, Ota - Dzik, Petr
PY - 2011
TI - Atomic force microscopy analysis of nanoparticles in non-ideal conditions
JF - Nanoscale Research Letter
VL - 6
IS - 1
SP - "nestránkováno"
EP - "nestránkováno"
PB - Springer
SN - 19317573
KW - DYNAMIC LIGHT-SCATTERING
KW - POLYURETHANE NANOPARTICLES
KW - ELECTRON-MICROSCOPY
KW - SURFACES
KW - RECONSTRUCTION
KW - NANOSPHERES
KW - FILMS
KW - SIZE
KW - TIPS
KW - PD
N2 - Nanoparticles are often measured using atomic force microscopy or other scanning probe microscopy methods. For isolated nanoparticles on flat substrates, this is a relatively easy task. However, in real situations, we often need to analyze nanoparticles on rough substrates or nanoparticles that are not isolated. In this article, we present a simple model for realistic simulations of nanoparticle deposition and we employ this model for modeling nanoparticles on rough substrates. Different modeling conditions (coverage, relaxation after deposition) and convolution with different tip shapes are used to obtain a wide spectrum of virtual AFM nanoparticle images similar to those known from practice. Statistical parameters of nanoparticles are then analyzed using different data processing algorithms in order to show their systematic errors and to estimate uncertainties for atomic force microscopy analysis of nanoparticles under non-ideal conditions. It is shown that the elimination of user influence on the data processing algorithm is a key step for obtaining accurate results while analyzing nanoparticles measured in non-ideal conditions.
ER -
KLAPETEK, Petr, Miroslav VALTR, David NEČAS, Ota SALYK a Petr DZIK. Atomic force microscopy analysis of nanoparticles in non-ideal conditions. \textit{Nanoscale Research Letter}. New York: Springer, 2011, roč.~6, č.~1, s.~''nestránkováno'', 9 s. ISSN~1931-7573. Dostupné z: https://dx.doi.org/10.1186/1556-276X-6-514.
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