Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes

DVOŘÁK, Pavel, Radek ŽEMLIČKA, Petr VAŠINA and Vilma BURŠÍKOVÁ. Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes. In Potential and Application of Nanotreatment of amedical Surfaces. 2011.

Basic information

• Original name: Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes
• Name in Czech: Aplikace vyšších harmonických frekvencí vznikajících ve vf. plazmatu pro monitorování depozičních procesů
• Authors: DVOŘÁK, Pavel (203 Czech Republic, guarantor), Radek ŽEMLIČKA (203 Czech Republic, belonging to the institution), Petr VAŠINA (203 Czech Republic, belonging to the institution) and Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution).
• Edition: Potential and Application of Nanotreatment of amedical Surfaces, 2011.

Other information

• Original language: English
• Type of outcome: Conference abstract
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: Czech Republic
• Confidentiality degree: is not subject to a state or trade secret
• RIV identification code: RIV/00216224:14310/11:00050417
• Organization unit: Faculty of Science
• Keywords (in Czech): vyšší harmonické frekvence; kapacitně vázané výboje
• Keywords in English: higher harmonic frequencies; capacitively coupled discharges

Abstract

Higher harmonic frequencies of discharge voltage or current were analyzed and used for monitoring of various deposition techniques. It was shown that higher harmonics sensitively react on creation of a thin film, which can be used for simple monitoring of plasma processes.

Abstract (in Czech)

Analýza vyšších harmonických frekvencí vznikajících ve vf. plazmatu s ohledem na jejich využití při monitorování plazmových procesů.

Links

• GA202/07/1669, research and development project: Name: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích

Investor: Czech Science Foundation, Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges

• MSM0021622411, plan (intention): Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface