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@proceedings{968089, author = {Dvořák, Pavel and Žemlička, Radek and Vašina, Petr and Buršíková, Vilma}, booktitle = {Potential and Application of Nanotreatment of amedical Surfaces}, keywords = {higher harmonic frequencies; capacitively coupled discharges}, language = {eng}, title = {Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes}, year = {2011} }
TY - CONF ID - 968089 AU - Dvořák, Pavel - Žemlička, Radek - Vašina, Petr - Buršíková, Vilma PY - 2011 TI - Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes KW - higher harmonic frequencies KW - capacitively coupled discharges N2 - Higher harmonic frequencies of discharge voltage or current were analyzed and used for monitoring of various deposition techniques. It was shown that higher harmonics sensitively react on creation of a thin film, which can be used for simple monitoring of plasma processes. ER -
DVOŘÁK, Pavel, Radek ŽEMLIČKA, Petr VAŠINA a Vilma BURŠÍKOVÁ. Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes. In \textit{Potential and Application of Nanotreatment of amedical Surfaces}. 2011.
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