Characterization of Amorphous Hydrocarbon Films Prepared by PECVD on Gold Substrate, Advanced Hybrid Materials II: design and applications of the E-MRS

ŠPERKA, Jiří, Lenka ZAJÍČKOVÁ, Jan SCHÄFER, Rüdiger FOEST, Annapurna PAMREDDY and Josef HAVEL. Characterization of Amorphous Hydrocarbon Films Prepared by PECVD on Gold Substrate, Advanced Hybrid Materials II: design and applications of the E-MRS. 2012.

Basic information

• Original name: Characterization of Amorphous Hydrocarbon Films Prepared by PECVD on Gold Substrate, Advanced Hybrid Materials II: design and applications of the E-MRS
• Name in Czech: Charakteristika amorfních uhlovodíků filmů připravených PECVD na podložce, Gold Advanced hybridní materiály II: Design a aplikace E-MRS
• Name (in English): Characterization of Amorphous Hydrocarbon Films Prepared by PECVD on Gold Substrate, Advanced Hybrid Materials II: design and applications of the E-MRS
• Authors: ŠPERKA, Jiří, Lenka ZAJÍČKOVÁ, Jan SCHÄFER, Rüdiger FOEST, Annapurna PAMREDDY and Josef HAVEL.
• Edition: 2012.

Other information

• Type of outcome: Organization of a conference
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• Organization unit: Faculty of Science

Abstract

The chemical and morphological characterization of hydrocarbons on gold used as functionalized interfaces plays an important role in microelectronics and bio-sensorics. Amorphous hydrocarbon films have been prepared on gold substrate by means of plasma enhanced chemical vapour deposition (PECVD). The study compares film properties achieved by two different PECVD techniques: one at low pressure, the other one at atmospheric pressure conditions. The low pressure PECVD (8 kPa) proceeded in bell jar plasma reactor generating a dual frequency discharge (2.45 GHz and 13.56 MHz) in the mixture of hydrogen and methane. In contrast to this, the PECVD at atmospheric pressure has been carried out with a capillary plasma jet operating at 27.12 MHz in the gas mixture of argon, hydrogen and methane. The experiment reveals an application potential of the deposition in comparison with the conventional technique. The deposited films have been characterized by a high resolution scanning electron microscopy (SEM), laser desorption-ionization time of flight mass spectrometry (TOF MS) and infrared reflection absorption spectroscopy (IRRAS). The suitable combination of the methods enables an interpretation of the microstructuring of the films. Moreover, carbon cluster distributions have been found in MS spectra of different layers. The results correlate with the morphological characterization obtained with SEM and with the characteristic bands in finger print region of IRRAS spectra.

Abstract (in Czech)

Chemické a morfologické charakteristiky uhlovodíků na zlato používané jako funkcionalizovaných rozhraní hraje Důležitou roli v mikroelektronice a bio-senzorika. Amorfní uhlovodíků filmy byly připraveny na zlato podkladu pomocí plazmatické chemické depozice vyšší par (PECVD).Studie srovnává vlastnosti filmu dosaženo dvěma různými technikami PECVD: jednak při nízkém tlaku, druhý při atmosférickém tlaku podmínek. Nízký tlak PECVD (8 kPa) postupovala v bell jar reaktoru plazmového vytváří dvojí frekvenci vypouštění (2.45 GHz a 13,56 MHz) ve směsi vodíku a metanu. V kontrastu k tomu, PECVD za atmosférického tlaku bylo provedeno s kapilární provozu plazmové jet na 27.12 MHz v plynné směsi argonu, vodíku a metanu.Experiment ukazuje, aplikační potenciál depozice ve srovnání s konvenční technika. Uložená filmy byly charakterizovány vysokým rozlišením rastrovacího elektronového mikroskopie (SEM), laserová desorpce-ionizace doba letu TOF hmotnostní spektrometrie (MS) a infračervené reflexe absorpční spektrometrie (IRRAS).Vhodná kombinace metod umožňuje výklad microstructuring filmů. Kromě toho bylo rozdělení uhlíku clusteru byly nalezeny v různých spektrech z MS vrstev. Výsledky korelují s morfologickou charakteristikou získanou pomocí SEM a charakteristické pásy v otisků prstů oblasti spektra IRRAS týden

Abstract (in English)

The chemical and morphological characterization of hydrocarbons on gold used as functionalized interfaces plays an important role in microelectronics and bio-sensorics. Amorphous hydrocarbon films have been prepared on gold substrate by means of plasma enhanced chemical vapour deposition (PECVD). The study compares film properties achieved by two different PECVD techniques: one at low pressure, the other one at atmospheric pressure conditions. The low pressure PECVD (8 kPa) proceeded in bell jar plasma reactor generating a dual frequency discharge (2.45 GHz and 13.56 MHz) in the mixture of hydrogen and methane. In contrast to this, the PECVD at atmospheric pressure has been carried out with a capillary plasma jet operating at 27.12 MHz in the gas mixture of argon, hydrogen and methane. The experiment reveals an application potential of the deposition in comparison with the conventional technique. The deposited films have been characterized by a high resolution scanning electron microscopy (SEM), laser desorption-ionization time of flight mass spectrometry (TOF MS) and infrared reflection absorption spectroscopy (IRRAS). The suitable combination of the methods enables an interpretation of the microstructuring of the films. Moreover, carbon cluster distributions have been found in MS spectra of different layers. The results correlate with the morphological characterization obtained with SEM and with the characteristic bands in finger print region of IRRAS spectra.