Výpis publikací

HEGER, Dominik, Ľubica KLÍČOVÁ, Petr SLAVÍČEK, Peter ŠEBEJ, Tomáš ŠOLOMEK, Petr KLÁN a Jakob WIRZ. Excited state dynamics of 4-hydroxyacetophenone - a model for 4-hydroxyphenacyl protecting groups. In 23rd IUPAC Symposium on Photochemistry. 2010.

ŠEBEJ, Peter, Richard S. GIVENS a Petr KLÁN. Solvent-switchable photoreaction of alpha-substituted 2-methyl-4-hydroxyphenacyl compounds. In 23rd IUPAC Symposium on Photochemistry. 2010.

STENSRUD, Kenneth F., Dominik HEGER, Peter ŠEBEJ, Jakob WIRZ a Richard S. GIVENS. Fluorinated photoremovable protecting groups: the influence of fluoro substituents on the photo-Favorskii rearrangement. Photochemical & Photobiological Sciences. Cambridge, UK: Royal Society of Chemistry, 2008, roč. 7, č. 5, s. 614 - 624, 10 s. ISSN 1474-905X.

GIVENS, Richard, Dominik HEGER, Bruno HELLRUNG, Yavor KAMDZHILOV, Marek MAC, Peter CONRAD, Elizabeth COPE, Jong LEE, Julio MATA-SEGREDA, Richard SCHOWEN a Jakob WIRZ. The Photo-Favorskii Reaction of p-Hydroxyphenacyl Compounds Is Initiated by Water-Assisted, Adiabatic Extrusion of a Triplet Biradical. J. Am. Chem. Soc. Washington: American Chemical Society, 2008, roč. 130/2008, č. 11, s. 3307-3309. ISSN 0002-7863.

ŠEBEJ, Peter, Pavla BRANCOVÁ, Ľubica HROUDNÁ, Tomáš ŠOLOMEK a Petr KLÁN. 2-Nitrobenzylidene Moiety as a Photoremovable Protecting Group for Diols. In 22nd IUPAC Symposium on Photochemistry. Gothenburg, Švedsko: IUPAC, 2008, s. 541.